Samsung Display Co., Ltd.

Gyungmin Baek

Hyuneok Shin

Juhyun Lee

Sangwon Shin

Hongsick Park

Hyunah Sung

Hyunmin Cho

Taewook Kang

Shin Il Choi

Sanggab Kim

Sang-Gab Kim

Hong-Sick Park

Dongmin Lee

Sangwoo Sohn

Hyun-Eok Shin

Dokeun Song

Jongoh Seo

Byungsoo So

Kyeongsu Ko

Sang-Won Shin

NamWook Kang

Jaeuoon Kim

You Jong Lee

Dooseon Yu

A display device includes a substrate with a display area and a non-display area adjacent to the display area, a transistor disposed in the display area of the substrate and on the substrate, a reflective electrode disposed on the transistor and electrically connected to the transistor, the reflective electrode including molybdenum (Mo), an insulating film disposed on the reflective electrode and including at least one thin film layer, the at least one thin film layer including a first thin film including a material having a refractive index of about 2.0 or more, and a second thin film disposed on the first thin film and including a material having a refractive index of about 1.8 or less, a contact electrode disposed on the insulating film and electrically connected to the reflective electrode and a light emitting diode disposed on the insulating film and electrically connected to the contact electrode.

Display device and method of manufacturing the same

A deposition apparatus includes: a susceptor provided with a plurality of susceptor holes defined therein; an electrostatic chuck disposed on the susceptor and provided with a plurality of electrostatic chuck holes defined therein; and a plurality of pins penetrating through the susceptor and the electrostatic chuck to connect the susceptor and the electrostatic chuck. Each of the pins includes a first portion disposed in a corresponding electrostatic chuck hole of the plurality of electrostatic chuck holes and a second portion disposed in a corresponding susceptor hole of the plurality of susceptor holes. The first portion includes a first base portion and a first cooler disposed in the first base portion.

Deposition apparatus and display panel manufacturing apparatus including the same

A display device and a method of manufacturing a display device are provided. A method of manufacturing a display device may include: forming a sacrificial layer on a carrier glass; forming a first substrate layer on the sacrificial layer, the first substrate layer including an organic insulation material; forming a first through-hole in the first substrate layer, the first through-hole passing through the first substrate layer; forming a wiring on an upper surface of the first substrate layer, the wiring extending into the first through-hole; sequentially forming a circuit layer, an emission layer, and an encapsulation layer on the wiring; separating the sacrificial layer and the carrier glass from the first substrate layer by irradiating the sacrificial layer with a laser; and attaching a driving element on a lower surface of the first substrate layer, the driving element being electrically connected to the wiring through the first through-hole.

Display device and method of manufacturing display device

A display device includes a substrate including a module-corresponding area including a sub-pixel area, and a transparent area, a display area surrounding a part of the module-corresponding area and including a sub-pixel area, and a pixel circuit area at one side of the display area, a signal wire in the module-corresponding area, and extending from the module-corresponding area to the pixel circuit area, an insulating layer on the signal wire, a lower electrode connected to the signal wire through a contact hole in the insulating layer, the lower electrode including a low reflection layer in the sub-pixel area, and on the insulating layer, a high refraction layer on the low reflection layer, a first metal layer on the high refraction layer, and a second metal layer on the first metal layer, a light emitting layer on the lower electrode, an upper electrode on the light emitting layer, and a functional module in the module-corresponding area on a bottom surface of the substrate.

Display device

A display substrate may include a substrate and a wiring on the substrate. The wiring may include a metal oxide layer including at least one oxide selected from tantalum (Ta), niobium (Nb), and titanium (Ti), and a metal layer on the metal oxide layer and including copper (Cu), and a thickness of the metal oxide layer may be in a range of about 30 angstroms (Å) to about 50 Å.

Display substrate, manufacturing method therefor, and display device including same

A display device includes a display panel configured to display an image, and an input sensing layer disposed on the display panel. The input sensing layer includes a sensing insulating layer disposed on the display panel and a conductive layer disposed on the sensing insulating layer. The conductive layer includes a barrier layer disposed directly on the sensing insulating layer and including metal nitride and a main conductive layer disposed on the barrier layer.

A method of manufacturing a display panel includes forming a circuit layer including a gate, a source, and a drain on a base substrate and forming a light emitting element layer on the circuit layer. The forming of the circuit layer includes sequentially forming a preliminary metal layer, a preliminary oxide layer comprising molybdenum and tantalum, and a preliminary capping layer which comprise a preliminary electrode layer, cleaning the preliminary electrode layer, forming a photoresist layer pattern on the preliminary electrode layer, etching the preliminary electrode layer, and removing the photoresist layer pattern. During the etching of the preliminary electrode layer, a ratio between a removal speed ERof the preliminary oxide layer and a removal speed ERof the preliminary metal layer satisfies Equation 1 to maintain a low reflection property1≤≤3.  [Equation 1]

Method of manufacturing display panel with circuit-layer stack including metal, oxide, and capping layers, and display panel manufactured by the same

A display device may include a display panel having a first region and a second region having a transmittance lower than a transmittance of the first region, the display panel including a substrate and a pixel layer disposed on the substrate, and an anti-reflection layer disposed on one side of the substrate in an area corresponding to the first region. The anti-reflection layer may include a first anti-reflection pattern including first metal and a second anti-reflection pattern disposed on the first anti-reflection pattern and including molybdenum oxide (MoO) and oxide of second metal other than molybdenum.

Display device capable of preventing external light reflection

A display apparatus includes a substrate; a thin-film transistor on the substrate, where the thin-film transistor includes a semiconductor layer and a gate electrode overlapping the semiconductor layer with a first insulating layer between the gate electrode and the semiconductor layer; and a display element electrically connected to the thin-film transistor. The gate electrode includes a first lower layer and a first upper layer on the first lower layer and including a different material from the first lower layer. The first lower layer has a first thickness from an upper surface of the first insulating layer, and the first upper layer has a second thickness from an upper surface of the first lower layer, where the second thickness is greater than the first thickness.

High-resolution display apparatus with low-resistance wiring

A method of manufacturing a display panel includes forming a circuit layer including a gate, a source, and a drain on a base substrate and forming a light emitting element layer on the circuit layer. The forming of the circuit layer includes sequentially forming a preliminary metal layer, a preliminary oxide layer comprising molybdenum and tantalum, and a preliminary capping layer which comprise a preliminary electrode layer, cleaning the preliminary electrode layer, forming a photoresist layer pattern on the preliminary electrode layer, etching the preliminary electrode layer, and removing the photoresist layer pattern. During the etching of the preliminary electrode layer, a ratio between a removal speed ERof the preliminary oxide layer and a removal speed ERof the preliminary metal layer satisfies Equation 1 to maintain a low reflection property1&#x2264;&#x2264;3.&#x2003;&#x2003;[Equation 1]

Method of manufacturing display panel utilizing ratio of etching removal speeds and display panel manufactured by the same

A manufacturing method of a display apparatus including preparing a substrate, forming an amorphous silicon layer on the substrate, cleaning the amorphous silicon layer with hydrofluoric acid, crystallizing the amorphous silicon layer into a polycrystalline silicon layer, and forming a metal layer directly on the polycrystalline silicon layer.

Method for manufacturing display apparatus

A display device includes a base layer, a pixel disposed on the base layer and including a thin film transistor, and a signal line connected to the pixel. The signal line includes a metal layer and a capping layer disposed on the metal layer, including molybdenum and tantalum. The metal layer has a first light reflectance, and the capping layer has a second light reflectance that is lower than the first light reflectance of the metal layer. The capping layer includes a tip protruding from a sidewall of the metal layer, and the tip protrudes more than a contact point at which the sidewall of the metal layer contacts with the base layer when viewed in a plane. The display device has an improved external light reflection characteristic and an enhanced display quality.

A display panel includes a base substrate, a pixel including a thin film transistor and a display element, a first signal line connected to the pixel, and a second signal line disposed on a layer different from the first signal line. At least one of the first signal line and the second signal line includes a lower layer including a conductive material and an upper layer disposed on the lower layer and including a conductive material. The upper layer has an etch selectivity in a range equal to or greater than about 0.5 and equal to or smaller than about 3 with respect to the lower layer.

Display panel

A display device includes a base layer, a display element disposed on the base layer, and a signal line disposed on the base layer and electrically connected to the display element. The signal line includes a conductive layer and a capping layer. The capping layer is disposed on the conductive layer and includes vanadium nitride (VN) and zinc oxide (ZnO). The display device may reduce the reflection of an external light source, thereby having improved visibility.

A conductive pattern includes a metal layer and a first low reflective layer disposed on a first surface of the metal layer, the first low reflective layer including niobium carbide (NbC) and zinc oxide (ZnO).

Growing community of inventors

Yongin-si, South Korea

Gyungmin Baek