Samsung Display Co., Ltd.

Gyu-Po Kim

Hong-Sick Park

Kitae Kim

Jong-Hyun Choung

Bong-Kyun Kim

Dae-Woo Lee

Hyun-Cheol Shin

Jonghee Park

Jin Seock Kim

Wang-Woo Lee

Sam-Young Cho

Jinseock Kim

Jong Hee Park

Ki Tae Kim

Won-Guk Seo

Sang-Hyuk Lee

Zheng Hong

Young-Woo Park

Seung-Yeon Han

An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.

Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same

An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.

Etching composition, method for forming pattern and method for manufacturing a display device using the same

An etchant composition is presented. The composition includes: 18 wt % to 25 wt % of a first organic acid compound; 15 wt % to 20 wt % of a second organic acid compound; 8.1 wt % to 9.9 wt % of an inorganic acid compound; 1 wt % to 4.9 wt % of a sulfonic acid compound; 10 wt % to 20 wt % of a hydrogen sulfate salt compound; 1 wt % to 5 wt % of a nitrogen-containing dicarbonyl compound; 1 wt % to 5 wt % of an amino acid derivative compound; 0.1 wt % to 2 wt % of an iron-containing oxidizing agent compound; and a balance amount of water.

Etchant composition and manufacturing method of metal pattern using the same

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Yongin-si, South Korea

Gyu-Po Kim