Lg Chem, Ltd

Sk Innovation Co., Ltd.

Sk Energy Co., Ltd.

Sk Ie Technology Co., Ltd.

Gwi-Gwon Kang

Jung-Won Kang

Min-Jin Ko

Myung-Sun Moon

Bum-Gyu Choi

Young-Duk Kim

Dong-Seok Shin

Young-Keun Lee

Jang-weon Rhee

Hye-Yeong Nam

Byung-Ro Kim

Sang-Min Park

Hae-Young Nam

Won-Jong Kwon

Je-An Lee

Dae-Ho Kang

Jae-Ho Cheong

In-Hwa Jung

Byoung-Cheon Jo

Jung-Moon Sung

In-hwa Jung

Byung-ro Ko

Hye-yeong Nam

Chol-Ho Lee

Hye-Yeong Lg Chem Ltd Nam

Bum-Gyu 7-107 Lg Chemical Apartment Choi

Min-Jin 105-1406 Luckyhana Apartment Ko

Disclosed in the present invention are a microporous polyethylene film and a method of manufacture thereof. The polyethylene microporous film manufactured according to the present invention may contribute to an increased productivity of stable products as its extrusion and stretching may be done readily. And thus manufactured product may be used for battery separators and various filters owing to its high gas permeability, superior puncture strength, and small ratio of shrinkage.

Microporous polyethylene film manufactured according to liquid-liquid phase separation and method of producing the same

The present invention is related to microporous polyolefin films that may be used for battery separators and the methods of manufacturing the same. These microporous polyolefin films are characterized by being manufactured in a method comprising the steps of melt-extruding a composition, comprised of 20-50 weight % of a resin composition, comprised of 90-98 weight % of polyethylene (Component I) having a weight average molecular weight of 2&#xd7;10&#x2dc;4&#xd7;10and less than 5 weight % of molecules of which molecular weight is less than 1&#xd7;10and less than 5 weight % of molecules of which molecular weight is greater than 1&#xd7;10, and 2-10 weight % of polypropylene (Component II) of which weight average molecular weight is 3.0&#xd7;10&#x2dc;8.0&#xd7;10and the peak of the melting point is higher than 145&#xb0; C., and 80-50 weight % of a diluent (Component III), to mold in the form of sheets; stretching the above sheets to the form of films; extracting the diluent from the above films; and heat-setting the above films. They are also characterized by having a puncture strength of greater than 0.14 N/&#x3bc;m, Darcy's permeability constant of greater than 1.5&#xd7;10Darcy, shut-down temperature of microporous films of lower than 140&#xb0; C., and melt-down temperature of higher than 160&#xb0; C. They can enhance the performance and stability of batteries using them as well as the productivity of microporous films owing to their high thermal stability and superior extrusion compoundability and physical properties.

Microporous polyolefin film with improved meltdown property and preparing method thereof

The present invention relates to a process for manufacturing a microporous polyolefin film which can be used for various battery separators, separating filters and membranes for microfiltration. The process for manufacturing a microporous polyolefin film according to the invention comprises mixing/extrusion through efficient and separate injection of 15-55% by weight of polyolefin (Component I), and 85-45% by weight of a diluent (Component II) which forms thermodynamic single phase with the polyolefin and a diluent (Component III) which can undergo thermodynamic liquid-liquid phase separation with the polyolefin, into an extruder.

Preparing method of microporous polyolefin film through effective extrusion

The present invention relates to an organic silicate polymer prepared by mixing silane compound with organic solvent to prepare a first mixture, and hydrolyzing and condensing the first mixture by adding water and catalyst, the first mixture being selected from a group consisting of oxidized hydrosilane, cyclic siloxane, a second mixture of oxidized hydrosilane and silane or silane oligomer, and a third mixture of cyclic siloxane and silane or silane oligomer, a composition for forming an insulation film of semiconductor devices prepared by using the organic silicate polymer, a method for preparing an insulation film using the composition, and a semiconductor device comprising the insulation film.

Organic silicate polymer and insulation film comprising the same

The present invention relates to organic siloxane resins and insulating films using the same. The insulating films are manufactured by using organic siloxane resins, wherein organic siloxane resins are hydrolysis-condensation polymers of silane compounds comprising one or more kinds of hydrosilane compounds. They have superior mechanical properties and a low electric property, and therefore, are properly usable for highly integrated semiconductor devices.

Organic siloxane resins and insulating film using the same

The present invention relates to a coating composition for insulating film production, a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same, and more particularly to a coating composition for insulating film production having a low dielectric constant and that is capable of producing an insulating film with superior mechanical strength (elasticity), a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same. The coating composition of the present invention comprises an organic siloxane resin having a small molecular weight, and water, and significantly improves low dielectricity and mechanical strength of an insulating film.

Coating composition for insulating film production, preparation method of insulation film by using the same, insulation film for semi-conductor device prepared therefrom, and semi-conductor device comprising the same

Provided is a process for manufacturing an insulating film for a semiconductor device. The process includes preparing a composition for forming an insulating film, wherein the composition comprises a) an organosilicate polymer and b) an organic solvent. The composition is coated on a substrate of a semiconductor device to prepare a coated insulating film, and the coated insulated film is dried and cured. Also provided are an insulating film prepared as described as well as a semiconductor device comprising the insulating film.

Organosilicate polymer and insulating film therefrom

The present invention relates to a nanopore-forming material for forming an insulating film for a semiconductor device, and more particularly to a nanopore-forming organic material containing a triazine functional group and preparation thereof, and a composition for forming an insulating film for a semiconductor device comprising the same, an insulating film using the same, and a manufacturing process thereof. The pore-forming material of the present invention is easy to synthesize, and the molecular weight, molecular structure, and microenvironment thereof are easy to control, and thus it is suitable for a nanopore-forming material.

Nanopore forming material for forming insulating film for semiconductors and low dielectric insulating film comprising the same

The present invention relates to a low dielectric substance essential for a next generating electrical device such as a semiconductor device having high performance and high density, and particularly to a process for preparing a low dielectric organosilicate polymer, a hydrolysis condensation product of a carbon-bridged oligomer; a process for manufacturing an insulating film using an organosilicate polymer prepared by the process; and an electrical device comprising an insulating film prepared by the process. The organosilicate polymer prepared according the process of the present invention is thermally stable, and has good film-forming prosperities, excellent mechanical strength and crack resistance, and the film manufactured therefrom has excellent insulating properties, film uniformity, dielectric properties, crack resistance, and mechanical strength.

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Daejeon, South Korea

Gwi-Gwon Kang