Asml Netherlands B.v.

Günes Nakiboglu

Frank Johannes Jacobus Van Boxtel

Yuri Johannes Gabriël Van De Vijver

Coen Hubertus Matheus Baltis

Daan Daniel Johannes Antonius Van Sommeren

Jan Steven Christiaan Westerlaken

Laurentius Johannes Adrianus Van Bokhoven

Engelbertus Antonius Fransiscus Van Der Pasch

Thibault Simon Mathieu Laurent

Johan Gertrudis Cornelis Kunnen

Ruud Hendrikus Martinus Johannes Bloks

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Siegfried Alexander Tromp

Jorge Alberto Vieyra Salas

Marinus Jan Remie

Bert Dirk Scholten

Mark Johannes Hermanus Frencken

Aleksandar Nikolov Zdravkov

Suzanne Johanna Antonetta Geertruda Cosijns

Harold Sebastiaan Buddenberg

Walter Theodorus Matheus Stals

Anne Willemijn Bertine Quist

Josephus Peter Van Lieshout

Lukasz Sosniak

Nicolaas Rudolf Kemper

Marc Wilhelmus Maria Van Der Wijst

Jeroen Gerard Gosen

Mark Constant Johannes Baggen

Koen Cuypers

Martinus Van Duijnhoven

Sander Kerssemakers

Johannes Cornelis Paulus Melman

Robertus Mathijs Gerardus Rijs

Hendrikus Herman Marie Cox

Martijn Van Baren

Thomas Petrus Hendricus Warmerdam

Gerard Johannes Boogaard

Johannes Pieter Kroes

Maria Del Carmen Mercado

Erwin Antonius Henricus Franciscus Van Den Boogaert

Jessica Henrica Anna Verdonschot

Maria Del Carmen Mercado Carmona

Johannes Cornelius Paulus Melman

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

Substrate holder, a lithographic apparatus and method of manufacturing devices

An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

Patterning device cooling apparatus

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus

A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

Lithographic apparatus and method

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, lithographic apparatus and method of operating a lithographic apparatus

A lithography apparatus includes: a projection system configured to project a desired image onto a substrate; an active module that generates a time-varying heat load; a temperature conditioning system configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer including a phase change material in thermal contact with the active module, the phase change material having a phase change temperature such that the phase change material is caused to undergo a phase change by the time-varying heat load, and wherein the phase change material is stationary relative to the projection system during critical operations of the lithography apparatus.

Lithography apparatus and a method of manufacturing a device

A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.

A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber () in communication with the compartment and a perforated plate (), having a plurality of through-holes (), between the chamber and the compartment.

Lithographic apparatus

A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

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Eindhoven, Netherlands

Günes Nakiboglu