The Penn State Research Foundation

Other

Guy P Lavallee

Jeffrey M Catchmark

Gregory S McCarty

Youngchul Lee

Michael A Rogosky

Gregory S Mc Carty

Anat Hatzor-de Picciotto

A multi-layer resist process is used to define a sacrificial host structure used to produce a molecular ruler useful for defining structures via a lift-off type process. By using this process, the removal of the host structure is significantly simplified, and a structure is formed which is perfect for achieving a reproducible high yield lift-off. Moreover, the processes disclosed are completely compatible with volume IC manufacturing processes, and uses a minimum of the organic material which, in a high volume production application, will dramatically reduce solution depletion.

Manufacturing method for molecular rulers

A method of fabricating a pattern on a surface of a substrate includes applying at least one non-molecular lithographic technique with at least one molecular lithographic technique to simultaneously define a size and shape of at least one of the features of the pattern. The pattern includes a nanoscale gap between features, the gap having a width defined by the thickness of one or more molecular layers used in one of the molecular lithographic techniques.

Method for simultaneous patterning of features with nanometer scales gaps

Using polymeric dielectric materials (preferably materials derived from bisbenzocyclobutene monomers) and an electron beam lithography process for patterning this material, we have developed a process for fabricating optical waveguides with complex integrated devices such as gratings. Such gratings are not limited to one-dimensional type gratings but can include 2 dimensional gratings such as curved gratings or photonic crystals. Due to the properties of BCB, this process could also be implemented using optical photolithography depending upon the waveguide dimensions desired and the grating dimensions desired. Alternatively, the optical waveguide could be patterned using optical lithography and the grating can be patterned using electron beam lithography. In addition, the general process described below can be applied to the fabrication of complex lightwave circuits containing, for example, multiple optical waveguides, couplers/splitters, grating based filters and even more complex devices and structures.

Optical waveguides and grating structures fabricated using polymeric dielectric compositions

The integration, packaging and assembly of optical components, optoelectronic components and submounts using features pressed into ceramic elements. The submounts may be composed of a ceramic material and contain optical and optoelectronic components. The submounts can be movable to change the optical characteristics of modules created through the integration of optical or optoelectronic components. Such modules can have functions including optical detection, optical signal generation, optical signal branching or processing, optical switching, optical multiplexing or de-multiplexing, optical modulation or optical transmission. The disclosure also provides an example, which is not meant to be limiting, of an optical module including two or more optical components and a packaging, integration and assembly platform.

Optical and optoelectronic packaging and integration platform with stationary and movable elements

A method of patterning a layer of e-beam sensitive dielectric material, such as bisbenzocyclobutene monomers, using electron beam lithography.

Patterning compositions using E-beam lithography and structures and devices made thereby

Using polymeric dielectric materials (preferably materials derived from bisbenzocyclobutene monomers) and an electron beam lithography process for patterning this material, we have developed a process for fabricating optical waveguides with complex integrated devices such as gratings. Such gratings are not limited to one-dimensional type gratings but can include 2 dimensional gratings such as curved gratings or photonic crystals. Due to the properties of BCB, this process could also be implemented using optical photolithography depending upon the waveguide dimensions desired and the grating dimensions desired. Alternatively, the optical waveguide could be patterned using optical lithography and the grating can be patterned using electron beam lithography. Gratings with much more dimensional precision can be fabricated using electron beam lithography. Gratings fabricated with precise dimensional control are required, for example, for many applications including Dense Wavelength Division Multiplexing (DWDM) for telecommunications applications.

A packaging platform, and method for producing the platform, for integrating, aligning and securing two or more optical, optoelectronic and/or electronic components is provided. The platform provides features for positioning the these elements in the x, y and z directions. This platform can simplify the coupling of light from an optical or optoelectronic component to another optical or optoelectronic component or simplify the electrical coupling from an electronic or optoelectronic component to another electronic or optoelectronic component. This platform can also serve as the final packaging structure, which can be sealed or unsealed, for the integrated, aligned and/or secured optical, optoelectronic and electronic components, where said structure includes any required or desired optical, electrical and/or mechanical features.

Growing community of inventors

State College, PA, United States of America

Guy P Lavallee