Applied Materials Israel Limited

Guy Eitan

Igor Petrov

Igor Krivts (Krayvitz)

Albert Karabekov

Eitan Kidron

Lior Segev

Irit Ruach Nir

Igal Ben-Dayan

A system and method are described, for use in cleaning of a vacuum chamber. The method comprising connecting a vacuum chamber to a plasma generating unit via a plasma connection port and connecting the vacuum chamber to a high vacuum pumping unit via a pumping port. A flow conductance through the plasma connection port to the vacuum chamber is controlled to limit passage of charged particles and cleaning substances produced in the plasma generating unit, to thereby maintain a working pressure inside the vacuum chamber while cleaning the vacuum chamber by said cleaning substances.

Method and system for cleaning a vacuum chamber

A method and system for inspecting an inspected object. The system includes: a detector adapted to detect charged particles scattered from a sample; a magnetic lens adapted to generate a magnetic field such as to direct a charge particle beam towards a sample and an first electrode positioned very close to an inspected object, wherein the first electrode comprises a very thin portion that defines a narrow aperture through which the charged particle beam can propagate.

Charged particle beam system and a method for inspecting a sample

Wafer supporting apparatus, including an electrostatic chuck for supporting the wafer. The apparatus further includes an electrostatic shield which is positioned in proximity to the chuck and the wafer, and a voltage source which is coupled to apply an electric field between the chuck and the wafer. The voltage source applies one or more potentials to the electrostatic shield so as to prevent penetration of particles to the wafer.

Particle trap for electrostatic chuck

Growing community of inventors

Haoranim, Israel

Guy Eitan