Commissariat a L'energie Atomique Et Aux Energies Alternatives

Commissariat a L'energie Atomique

Alcatel Vacuum Technology France

Guy Cheymol

Fernando Lomello

Olivier Sublemontier

Benoit Barthod

Pierre-Yves Thro

Philippe Cormont

Martin Schmidt

Ayoub Ladaci

Stéphane Gaillot

Hicham Maskrot El Idrissi

Laurent Remy

Nicolas Regazzoni

Quentin Pouille

A method for integrating a sensor into a metal part including creating, by additive printing, of a first portion of the part, including a volume for housing a sensor. The volume has a width greater than that of the sensor. The method also includes depositing the sensor in said housing volume and creating, by additive printing, a second portion of the part covering the sensor and forming a molten puddle in the housing volume, on either side of the sensor.

Method for integrating a sensor in a part made by additive manufacturing

A fiber-optic sensors for measuring deformation, intended to operate in a harsh environment is provided. The sensor comprises a Fabry-Perot-cavity-based optical measurement head, a linking optical fiber and an expansion reserve case, the case comprising a segment of the linking optical fiber. The inside thickness of the case is comprised between one and several millimeters, the case being flat and of shape referred to as bicorne shape, the shape comprising a convex central portion and two concave symmetric ends, the optical fiber forming, inside the bicorne, one and only one arch, the segment of the optical fiber being, in addition, tangent to the internal surfaces of the reserve case, whatever the temperature conditions.

Optical fibre sensor for measuring deformation, said sensor operating in a harsh environment

Deformation measurement sensor operating in a hostile environment and including an optical movement measurement module, and measurement system using said sensor. The sensor includes: an enclosure comprising an opening; a movable element having a first surface that is brought into contact with an object (4) that can deform, for example a nuclear fuel rod, and a second surface that is reflective and extends into the enclosure through the opening; a sealed, resilient connecting component performing a return function between the element and the enclosure; and, inside the enclosure, a module for creating an interference light using a light reflected by the second surface of the element. Deformation of the object results in a modification to the interference light that is representative of the deformation.

Deformation measurement sensor operating in a hostile environment and including an optical movement measurement module, and measurement system using said sensor

The device comprises a device () for creating an essentially linear target () in an evacuated space where laser beams () are focused, the target being suitable for interacting with the focused laser beams () to emit a plasma emitting radiation in the extreme ultraviolet. A receiver device () receives the target () after it has interacted with the focused laser beams (), and a collector device () collects the EUV radiation emitted by the target (). The focusing elements () for focusing the laser beams on the target () are arranged in such a manner that the laser beams () are focused on the target () laterally, being situated in a common half-space relative to the target () and being inclined at a determined angle lying in the range about 60&#xb0; to about 90&#xb0; relative to a mean collection axis () perpendicular to the target (). The collector device () is disposed symmetrically about the mean collection axis () in the half-space containing the laser beams () focused on the target () and inside a conical space () centered on the mean collection axis () with a vertex situated at the target () and a half-angle at the vertex that is less than the angle of inclination of the focused laser beams () relative to the mean collection axis (). The device is suitable for use as a source for EUV radiation in lithography for fabricating integrated circuits.

Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography

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Bures sur Yvette, France

Guy Cheymol