Beijing Gridsum Technology Co., Ltd.

Tsinghua University

Guosheng Qi

Xin He

Kun Qian

Fei Dai

Yongjian Huang

Duanyi Xu

Guofa Yu

Peijun Jiang

Xiaodong Fan

Provided are a rule matching method and device. The method includes: a preset tagging symbol set and a target text are acquired, wherein the tagging symbol set includes a plurality of tagging symbols (S), the plurality of tagging symbols are symbols which are used for tagging a text according to different business requirements; a plurality of matching rule templates are determined according to the plurality of tagging symbols (S); the target text is converted according to the plurality of tagging symbols to obtain a sequence to be matched (S); and a matching process is performing, by using the plurality of matching rule templates, on the sequence to be matched (S). The method solves the problem in the related art in which a rule matching method cannot match implicit text information.

Rule matching method and device

The disclosure discloses a monitoring method and device for pushing effect of pushing information. The monitoring method for the pushing effect of the pushing information includes: monitoring user Identifiers (ID) accessing a target website, wherein the target website is a website which displays the pushing information; monitoring user ID accessing a preset website; and determining the pushing effect of the pushing information according to first ID and second ID, wherein the first ID are the monitored user ID accessing the target website, and the second ID are the monitored user ID accessing the preset website. By the disclosure, the problem of incapability in making a statistic about the pushing effect of the pushing information in the conventional art is solved, and the effect of quantitatively monitoring the pushing effect of the pushing information is further achieved.

Method and device for monitoring push effect of push information

The invention relates to a device for photolithography of integrated circuits, at least comprising base plate, precision working table, optical head array; the optical head array adopts a line-array photosource scan-imaging device to realize the optical probe technique, and the line-array photosource scan-imaging device comprises a line-array photosource consisting of a plurality of adjacent linearly-arranged micro-photosources and the micro-imaging system performing micro-imaging for the photosource; the line-array photosource can realized not only with a plurality of micro-lasers but also with a line-array photosource device; a novel method is disclosed that can perform encoding based upon the line-array photosource scan width; an integrated circuit photolithographic method which can align the silicon wafer not only at the beginning of photolithography but also can repeatedly align it if needed during the photolithographic process.

Photolithography system having multiple adjustable light sources

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Beijing, China

Guosheng Qi