Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Gaona Aero Material Co., Ltd.

Guohua Xu

Yonggang Du

Peng Zeng

Wei Qin

Ran Duan

Bin Wu

Shuo Huang

Heyong Qin

Beijiang Zhang

Zhangfei Gao

Ling Hu

Guangpu Zhao

Xiangzhen Wang

Wenyun Zhang

Qiang Tian

Shifu Chen

The invention provides a preparation method of a nickel-based wrought superalloy wheel disk forging used at high temperature, in which the alloy has high content of solution strengthening elements W, Mo and strengthening phase γ' phase forming elements Al, Ti, Nb and γ′ phase content reaches 55-65%. In view of a series of technical problems caused by high γ′ phase to alloy smelting and forging, the high-temperature stress relief annealing, low-temperature stress relief annealing process of steel ingot and high temperature homogenizing annealing of steel bar were proposed by optimizing the thermal process of wheel disk forging and controlling the precipitation and dissolution of γ′ phase.

Preparation method of nickel-based wrought superalloy wheel disk forgings used at high temperature

A base substrate includes a first base layer and an electrostatic resistant layer that are disposed in a stack.

Base substrate and manufacturing method therefor, apparatus, display substrate, and display device

An array substrate is provided, comprising a display area and a non-display area outside the display area. The non-display area is provided with a first transistor and a first conductive region electrically connected with the first transistor. A control terminal, and one of a source and a drain of the first transistor are both electrically connected to a data line in the display area, the other of the source and the drain of the first transistor is electrically connected to the first conductive region. For this array substrate, the static electricity generated on the data line in the rubbing process can be led to the first conductive region through the first transistor, so as to prevent the static electricity from being transmitted to the display area, which could have destroyed the TFT device in the display area.

Array substrate and display device

A display substrate, a method of fabricating the same and a display device are provided. The display substrate includes a substrate and a groove formed on the substrate. The groove is formed by photoresist and the bottom surface of the groove exceeds a height of a pixel area.

Display substrate, method of fabricating the same, and display device

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Beijing, China

Guohua Xu