Beijing Naura Microelectronics Equipment Co., Ltd.

Beijing University of Technology

Guodong Chen

Gang Wei

Jing Yang

Jing Jing Wei

Xingfei Mao

Guoyu Zuo

Daoxiong Gong

Yahui Huang

Zhihui Shen

Erjun Xiao

Masaya Odagiri

Juanjuan Li

The present disclosure provides a semiconductor reaction chamber and an atomic layer plasma etching apparatus. The semiconductor reaction chamber includes a dielectric window and a reaction chamber body. The spray head is arranged between the dielectric window and the top wall of the reaction chamber body, and divides the plasma generation area into an upper strong plasma area and a lower weak plasma area. Moreover, a plurality of through-holes are distributed in the central area of the spray head and configured to allow the plasma in the strong plasma area to pass through. A first gas channel is arranged in an edge area of the spray head. The process reaction gas inlet member is located on a side where the gas inlet end of the first gas channel of the spray head is located. A second gas channel is arranged in the process reaction gas inlet member.

Semiconductor reaction chamber and atomic layer plasma etching apparatus

The invention discloses a fully automatic intelligent rubber tapping robot, which comprises a moving platform and a rubber tapping robot arm. The rubber cutting mechanical arm is installed on the moving platform. tapping robot arm is installed on the moving platform. The tapping robot arm is specially designed for rubber cutting operation, the end of the tapping robot arm is equipped with an end actuator, which is composed of a tree-hugging fixed device and a sliding rubber tapping device. The invention can carry out the rubber cutting operation independently without manual intervention, which greatly reducing the manual input, and obviously improving the rubber cutting efficiency and time economy conversion efficiency. The movable system can work alone in a whole rubber forest with a large working area and reduces the average input cost per tree. The technical indexes of the rubber tree, such as cutting depth, cutting skin consumption and cutting smoothness, all meet the requirements of traditional rubber cutting technology and have good popularization and application value.

Fully automatic intelligent rubber tapping robot

The present disclosure provides a radio frequency (RF) source control method. An RF source includes at least one pair of a main power supply and a secondary power supply with a same frequency. The RF source control method includes dividing each process step of process steps of a plasma process into a plurality of time periods, and when performing each process step, maintaining a common exciter (CEX) phase locking delay angle of the at least one pair of the main power supply and the secondary power supply corresponding to each of the time periods at a predetermined value to provide an increased angular distribution uniformity of plasma. The RF source control method provided by the present disclosure may be used to adjust plasma distribution above a to-be-processed workpiece to average the plasma angular direction distribution of the entire process step as a whole to increase process uniformity of the to-be-processed workpiece.

Control method of radiofrequency source

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Beijing, China

Guodong Chen