Ifire IP Corporation

Ifire Technology Corp.

Guo Liu

Xingwei Wu

Alexander Kosyachkov

Yue (Helen) Xu

Joe Acchione

Daniel Darcy Doxsee

Daniel Joseph Seale

Michael Roger Westcott

David Robin Lovell

George A Kupsky

Donald Edward Carkner

James Alexander Stiles

A physical vapor deposition method for the deposition of thioaluminate phosphor compositions includes providing one or more source materials including an intermetallic barium aluminum compound, a barium aluminum alloy or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.

Reactive metal sources and deposition method for thioaluminate phosphors

An improved fine grained zinc sulfide phosphor is provided for use in ac electroluminescent displays. The fine-grained zinc sulfide phosphor film exhibits improved luminance and may be used in conjunction with a structure or substance to minimize or prevent reaction of the fine grained phosphor with oxygen. The invention is particularly applicable to zinc sulfide phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.

Fine-grained rare earth activated zinc sulfide phosphors for electroluminescent displays

A novel structure is provided to improve the luminance and operating stability of phosphors used in ac thick film dielectric electroluminescent displays. The novel structure comprises aluminum nitride barrier layers in contact with the phosphor films to prevent phosphor degradation due to reaction with oxygen. The barrier layers can be deposited using vacuum deposition processes that are compatible with the processes used to deposit and anneal the phosphor films. The invention is particularly applicable to phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.

Aluminum nitride passivated phosphors for electroluminescent displays

A patterned phosphor structure and EL laminate containing same, forming red, green and blue sub-pixel phosphor elements for an AC electroluminescent display. The patterned phosphor structure includes at least a first and a second phosphor emitting light in different ranges of the visible spectrum, but with combined emission spectra contains red, green and blue light, the first and second phosphors being in a layer, arranged in adjacent, repeating relationship to each other to provide a plurality of repeating first and second phosphor deposits. The phosphor structure also includes one or more means associated with one or more of the first and second phosphor deposits for setting and equalizing the threshold voltages of the red, green and blue sub-pixel phosphor elements, and for setting the relative luminosities of the red, green and blue sub-pixel phosphor elements so that they bear set ratios to one another at each operating modulation voltage used to generate the desired luminosities for red, green and blue.

Electroluminescent laminate with patterned phosphor structure and thick film dielectric with improved dielectric properties

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Brampton, Canada

Guo Liu