Balzers Und Leybold Deutschland Holding Ag

Leybold Aktiengesellschaft

Leybold Systems Gmbh

Gunter Brauer

Joachim Szczyrbowski

Michael Scherer

Michael Liehr

Gotz Teschner

Ulrich Patz

Erwin Winter

Claus-Peter Klages

Martin Bahr

In an apparatus for the deposition of polycrystalline diamond on large, flat substrates (3) by the plasma method, with a vacuum chamber (4); with locks for the inward and outward transfer of the substrates; with a device installed in the chamber (4) for conveying the substrates (3) through at least one, preferably through two treatment stations; with hot-filament sources (5, 5', . . . ) forming a first group, installed above the plane of the substrates; with microwave plasma sources (8, 8', . . . ) forming a second group; with an electrode (11) fed with radio frequency underneath the plane of the substrates for generating a bias voltage; and with gas feed pipes (6, 9) opening into the vacuum chamber (4), the hot-filament arrangements (5, 5', . . . ), designed as linear sources, are arranged transversely to the substrate transport direction (a) and form a first coating zone (Z.sup.1), where the microwave plasma sources (8, 8', . . . ) are arranged in a row a certain distance away from, and parallel to, the hot-filament sources (5, 5', . . . ) and form together a second coating zone (Z).

Apparatus for the plasma-chemical deposition of polycrystalline diamond

A vacuum chamber includes a central compartment (1) in which a diode cathode (6) carrying an electrically conductive sputtering target (7) is located, and two outer compartments (11, 12) in which magnetron cathodes (13, 14) carrying target 15, 16) are located, the magnetron cathodes (13, 14) being connected to respective poles (20, 21) of an AC power source. The outer compartments (11, 12) are separated from the central compartment by walls having openings (33, 34) which flank a space (28) between the sputtering target (6) and the substrate (3). Process gas lines 24, 25) are arranged to introduce process gas into this space (3).

Apparatus for coating a substrate from an electrically conductive target

Pole shoes (3, 4, 5) of magnetically conductive material are provided inside of a first tubular target (2). Outside the target (2), a magnetic flux guide element (7) is provided, which has three pole shoes (8, 9, 10) directed toward the hollow body (1), which are connected to each other by magnets (12, 13). These magnets (12, 13) transmit the magnetic field through the target (2) to the pole shoes (3, 4, 5) inside the target (2) across narrow gaps (6, 11).

Apparatus for coating a substrate

A vacuum coating apparatus has a pot-like tank (2) against whose open side a portion of a substrate (1) can be held sealingly. In the tank (2) there is disposed a target (7). A shut-off plate (9) makes it possible after lowering the substrate (1) to hold this target (7) under vacuum in a source chamber (11) protected against intrusion of air.

Vacuum coating apparatus

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Freigericht, Germany

Gunter Brauer