Samsung Corning Precision Materials Co., Ltd.

Corning Precision Materials Co., Ltd.

GunSang Yoon

SeoHyun Kim

YoungZo Yoo

Hyung Soo Shin

Seung Ho Yoo

Taejung Park

Jeongwoo Park

SooHo Park

Myong Woon Kim

Sang Jun Yim

Sang Do Lee

Sang Ick Lee

Eun-Ho Choi

Bogyeong Kim

Hyunhee Lee

Young Zo Yoo

A conductive film substrate, a photovoltaic cell having the same, and a method of manufacturing the same. The conductive film substrate includes a base substrate and a transparent conductive film formed on the base substrate. The transparent conductive film is a zinc oxide thin film which has first texture structures and second texture structures concurrently formed on a surface thereof. The second texture structures are smaller than the first texture structures.

Conductive film substrate, photovoltaic cell having the same, and method of manufacturing the same

A zinc oxide precursor for use in deposition of a zinc oxide-based thin film contains a zincocene having the following formula or a derivative thereof: 

Zinc oxide precursor and method of depositing zinc oxide-based thin film using the same

A zinc oxide precursor for use in deposition of a zinc oxide-based thin film contains an alkyl zinc halide having the following formula: R&#x2014;Zn&#x2014;X, where R is an alkyl group CH, and X is a halogen group. The n is a number ranging from 1 to 4, and the alkyl group is one selected from among a methyl group, an ethyl group, an i-propyl group and a t-butyl group. The halogen group contains one selected from among F, Br, Cl and I. A method of depositing a zinc oxide-based thin film includes loading a substrate into a deposition chamber; and supplying the zinc oxide precursor which contains the above-described alkyl zinc halide and an oxidizer into the deposition chamber and forming a zinc oxide-based thin film on the substrate via chemical vapor deposition. The zinc oxide-based thin film is deposited on the substrate via atmospheric pressure chemical vapor deposition.

Zinc oxide precursor containing alkyl zinc halide and method of depositing zinc oxide-based thin film using the same

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GunSang Yoon