Samsung Electronics Co., Ltd.

Guk-Kwang Kim

Yun-sik Yang

Do-In Bae

Wan-Goo Hwang

Tae-Won Lee

Byeung-Wook Choi

Jaung-Joo Kim

Oh-Yeon Han

A metal gasket for a semiconductor fabrication chamber capable of preventing base plate metal contamination in the chamber, wherein the metal gasket includes a diffusion barrier layer interposed between a base plate and an anti-corrosive coating layer, and wherein the diffusion barrier layer prevents elements of the base plate from being diffused to the anti-corrosive coating layer. Accordingly, the diffusion barrier layer prevents attack on the anti-corrosive coating layer.

Metal gasket for a semiconductor fabrication chamber

An apparatus for processing a semiconductor wafer has a circular chuck and a focus ring. The chuck is located in a process chamber and holds the semiconductor wafer. The focus ring surrounds the semiconductor wafer held by the chuck and focuses processing gases or plasma on a surface of the semiconductor wafer. The focus ring has a stepped inner periphery formed by a cylindrical lower surface surrounding the wafer and having a first diameter, a cylindrical upper surface having a second diameter greater than the first diameter, and a collector interposed between the lower surface and the upper surface for collecting contaminants created at the upper surface due to a reaction between the processing media and the material of the focus ring. The collector collects particulate contaminants falling from the upper surface of the focus ring so that the contaminants do not reach the wafer.

Focus ring and apparatus for processing a semiconductor wafer comprising the same

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Suwon-shi, South Korea

Guk-Kwang Kim