Carl-zeiss-smt Ag

Guenther Seitz

Wilhelm Ulrich

Hans-Juergen Mann

Udo Dinger

Martin Weiser

Frank Eisert

Siegfried Stacklies

Jens Kugler

Rolf Freimann

Bernhard Geuppert

Bernd Doerband

Bernd Geh

Stefan Schulte

Thomas Ittner

Bernhard Fellner

Wolfgang Otto

A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.

Method of manufacturing an optical component

A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S), a second mirror (S), a third mirror (S), a fourth mirror (S), a fifth mirror (S), a sixth mirror (S), a seventh mirror (S), and an eighth mirror (S). The light bundles includes light with a wavelength in a range of 10-30 nm. The light is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.

8-mirror microlithography projection objective

A mirror for use in a projection exposure apparatus is described. The mirror has a main surface extending beyond an outline of an optical surface of the main surface. The optical surface has a roughness of less than 1 nm rms, and the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm. Manufacturing the mirror may involve polishing the optical surface in regions of the main surface extending beyond the optical surface and removing material of the substrate carrying a portion of the surface extending beyond the optical surface.

Mirror for use in a projection exposure apparatus

A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes eight mirrors. The light path is provided via the eight mirrors, and is free of obscuration.

The method serves for the interferometric measurement of non-rotationally symmetric wavefront errors on a specimen . The specimen is brought into a number of rotational positions, at least one measurement result being determined in each of the rotational positions and a mathematical evaluation of all measurement results is performed. The measurement results (M. . . M; N. . . N) of each of the measurement series (M, N) are determined respectively in mutually equidistant rotational positions of the specimen . The measurement results (M. . . M, N. . . N) of each of the at least two measurement series (M, N) are evaluated independently of one another for non-rotationally symmetric wavefront errors (&#x3c;W&#x3e;, &#x3c;W&#x3e;) on the specimen, and a difference is computationally rotated m or n times and the results averaged out. At least one of the wavefront errors (&#x3c;W&#x3e;, &#x3c;W&#x3e;) is corrected with the result (&#x3c;&#x3c;W&#x3e;-&#x3c;W&#x3e;&#x3e;or &#x3c;&#x3c;W&#x3e;-&#x3c;W&#x3e;&#x3e;) averaged in this way.

Method for the interferometric measurement of non-rotationally symmetric wavefront errors

A method of manufacturing an optical element having an optical surface extending close to a periphery of a substrate comprises: providing a substrate having a main surface extending beyond a periphery of the optical surface and also performing a polishing of the optical surface in regions of the main surface extending beyond the optical surface. Thereafter, material of the substrate carrying a portion of the surface extending beyond the optical surface is removed.

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Spiegelberg, Germany

Guenther Seitz