Robert Boschgmbh

Guenther-Nino-Carlo Ullrich

Johannes Classen

Denis Gugel

Antoine Puygranier

Markus Linck-Lescanne

Sebastian Guenther

Timm Hoehr

Andrea Orto

Jochen Reinmuth

Frank Fischer

Joerg Muchow

Torsten Ohms

Lars Tebje

Volkmar Senz

Andreas Scheurle

Markus Heitz

Carsten Geckeler

Ronald Gampp

A micromechanical sensor, including: a substrate; a movable mass element sensitive in three spatial directions; two x-lateral electrodes for detecting a lateral x-deflection of the movable mass element; two y-lateral electrodes for detecting a lateral y-deflection of the movable mass element; z-electrodes for detecting a z-deflection of the movable mass element; each lateral electrode being fastened on the substrate with the aid of a fastening element; the fastening elements of all electrodes being formed close to a connection element of the movable mass element to the substrate.

Micromechanical sensor and method for manufacturing a micromechanical sensor

A micromechanical structure for an acceleration sensor includes a movable seismic mass including electrodes, the seismic mass being attached to a substrate with the aid of an attachment element; first fixed counter electrodes attached to a first carrier plate; and second fixed counter electrodes attached to a second carrier plate, where the counter electrodes, together with the electrodes, are situated nested in one another in a sensing plane of the micromechanical structure, and where the carrier plates are situated nested in one another in a plane below the sensing plane, each being attached to a central area of the substrate with the aid of an attachment element.

Micromechanical structure for an acceleration sensor

A micromechanical z-acceleration sensor, including a seismic mass element including a torsion spring; the torsion spring including an anchor element, with the aid of which the torsion spring is connected to a substrate; the torsion spring being connected at both ends to the seismic mass element with the aid of a bar-shaped connecting element designed as normal with respect to the torsion spring in the plane of the seismic mass element.

Micromechanical z-acceleration sensor

A rocker device for a micromechanical Z sensor includes: two trough-shaped rocker arms mountable around a torsion pivot, the rocker device being configured asymmetrically with respect to the torsion pivot; and for each rocker arm, a strike region having at least one first strike element is provided, the strike region on each rocker arm being configured in definedly elevated fashion relative to a sensing region of the rocker device.

Rocker device for a micromechanical Z sensor

A micromechanical Z-sensor, including a rocker having trough structures which is twistably supported with the aid of a spring device, the rocker having a mass distribution which is asymmetric with respect to the spring device, first electrodes situated above the trough structure, and second electrodes situated below the rocker, and a catch device including at least one spring element against which a stop element which is anchored to a substrate is able to strike, at least two catch devices which are spatially separated from each other being provided per rocker arm of the rocker.

Micromechanical Z-sensor

A micromechanical sensor is provided which includes a substrate having a main plane of extension and a rocker structure which is connected to the substrate via a torsion means. The torsion means extends primarily along a torsion axis, and the torsion axis is situated essentially in parallel to the main plane of extension of the substrate. The rocker structure is pivotable about the torsion axis from a neutral position into a deflected position, and the rocker structure has a mass distribution which is asymmetrical with respect to the torsion axis. The mass distribution is designed in such a way that a torsional motion of the rocker structure about the torsion axis is effected as a function of an inertial force which is oriented along a Z direction which is essentially perpendicular to the main plane of extension of the substrate.

A micromechanical acceleration sensor includes a seismic mass and a substrate that has a reference electrode. The seismic mass is deflectable in a direction perpendicular to the reference electrode, and the seismic mass has a flexible stop in the deflection direction. The flexible stop of the seismic mass includes an elastic layer.

Flexible stop for an acceleration sensor

An inertial sensor, comprising a substrate and a rocker that is connected to the substrate via a spring apparatus, the spring apparatus having at least two springs for suspending the rocker on the substrate, the two springs being disposed with an offset from one another with reference to their longitudinal axis.

Inertial sensor with overlapping torsional springs

An acceleration sensor having a substrate, a first web that is connected to the substrate, and a seismic mass that is fashioned as a frame and is made up of four side frames, the first side frame and the third side frame being situated opposite one another, the second side frame and the fourth side frame being situated opposite one another, the second side frame and the first web being connected via a first spring element, stationary electrodes being provided inside the frame that are connected to the substrate, movable electrodes being provided that are connected to the first side frame and/or to the third side frame, the frame having a first transverse web that is connected to the first side frame and to the third side frame.

Acceleration sensor having a frame and transverse web

A method and a micromechanical component which counteract manufacturing-process-related mechanical stresses in the membrane are provided. The membrane is formed on a substrate in a layer system and spans a cavity in the substrate. The layer system includes at least one base layer formed on the substrate for circuit elements. At least one structured masking layer is also formed on the base layer for defining the circuit elements. The masking layer is structured in the area of the membrane in such a way that mechanical stresses acting in the area of the membrane under vacuum are at least partially compensated, the intrinsic stress of the masking layer being taken into account in the layout of the structuring.

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Reutlingen, Germany

Guenther-Nino-Carlo Ullrich