Honeywell International Inc.

Rudolph Technologies, Inc.

Guenadiy Lazarov

Aravind Padmanabhan

Anvar A Zakhidov

Ray H Baughman

George Andrew Antonelli

Teresa M Marta

Christopher J Morath

Michael Kotelyanskii

Guray Tas

Sean P Leary

Tong Zheng

Andre D Miller

Jamie I Ludke

Dane Larson

Jamie L Ludke

An optical metrology system is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films such as silicon dioxide, other carbon doped oxides over metal or semiconductor substrates. An index of refraction is measured by an ellipsometer and a wavelength of a laser beam is measured using a laser spectrometer. The angle of refraction is determined by directing a light pulse focused onto a wafer surface, measuring a first set of x, y, and zcoordinates, moving the wafer in the z direction, directing the light pulse onto the wafer surface and measuring a second set of x, yand zcoordinates, using the coordinates to calculate an angle of incidence, calculating an angle of refraction from the calculated angle of incidence, obtaining a sound velocity v, from the calculated angle of refraction and using the determined sound velocity v, to calculate a bulk modulus. Hardware calibration and adjustments for the optical metrology system are also provided in order to minimize the variation of the results from tool to tool down to about 0.5% or below.

Measuring elastic moduli of dielectric thin films using an optical metrology system

The invention relates to processes for the synthesis of 2-D and 3-D periodic porous silicon structures and composites with improved properties having the advantages of porous silicon and photonic bandgap materials. Photonic crystals comprise a two dimensionally periodic or three dimensionally periodic microporous structural matrix of interconnecting, crystallographically oriented, monodispersed members having voids between adjacent members, and said members additionally having randomly nanoporous surface porosity. The silicon nanofoam material shows enhanced and spectrally controlled/tunable photoluminescence and electroluminesce and finds use as transparent electrodes, high-lumonosity light emitting diodes (LEDs), wavelength division multiplexors, high-active-area catalyst supports, photonic bandgap lasers, silicon-based UV detectors, displays, gas sensors, and the like.

Light emitting photonic crystals

The invention provides photonic crystal optical demultiplexer devices produced from a three-dimensionally-periodic, porous, dielectric, photonic crystalline structure, which has surfaces or interfaces that are inverse replicas of the surfaces of a monodispersed sphere array. Such a photonic crystal optical demultiplexer comprises a three-dimensionally-periodic, porous, dielectric, photonic crystalline structure, which structure has surfaces or interfaces that are inverse replicas of the surfaces of a monodispersed sphere array, wherein necks exists between neighboring spheres in said sphere array and the average sphere diameter does not exceed about 1000 nm. A first optical waveguide is positioned to direct a broad wavelength band of incident light onto the crystalline structure. A second optical waveguide positioned to receive a narrow wavelength band of reflected light from the crystalline structure.

Optical demultiplexer based on three-dimensionally periodic photonic crystals

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Landing, NJ, United States of America

Guenadiy Lazarov