Az Electronic Materials (luxembourg) S.a.r.l.

Az Electronic Materials USA Corp.

Merck Patent Gmbh

Other

International Business Machines Corporation

Ridgefield Acquisition

Guanyang Lin

Hengpeng Wu

Jian Yin

Mark O Neisser

Huirong Yao

Margareta Paunescu

JiHoon Kim

Jianhui Shan

JoonYeon Cho

Yi Cao

SungEun Hong

M Dalil Rahman

Durairaj Baskaran

Orest Polishchuk

Zachary Bogusz

Daniel Sanders

Ralph R Dammel

Joy Cheng

Ankit Vora

Munirathna Padmanaban

Douglas S McKenzie

David J Abdallah

Takanori Kudo

Salem K Mullen

PingHung Lu

Melia Tjio

David John Abdallah

Jingxiu Wan

Shinji Miyazaki

WooKyu Kim

Robert Arent

Yi Yi

Yi Yl

Jain Yin

Chi-Sun Hong

Eri Hirahara

Jinxiu Wan

Douglas Mckenzie

Jihoon Kim

Yihoon Kim

Woo-Kyu Kim

The present invention relates to a composition comprises at least one random copolymer having at least one repeat unit of structure (1), The present invention also relates to novel processes for forming patterns using this novel crosslinked layer on a substrate by enable a film of a block copolymer coated on the novel crosslinked layer to undergo self-assembly. 

Polymer compositions for self-assembly applications

The present invention relates to a composition consisting essentially of an alkylbenzenesulfonic acid having structure (I) (wherein n is an integer from 0 to 16); a solvent which is either selected from the group consisting of solvents having structures (II), (wherein R is selected from the group consisting of &#x2014;(&#x2014;O&#x2014;CH&#x2014;CH&#x2014;)&#x2014;OH, &#x2014;OH, &#x2014;O&#x2014;C(&#x2550;O)&#x2014;CH, wherein n' is equal to 1, 2, 3, or 4), a solvent having structure (III), a solvent having structure (IV), and a solvent having structure (V), or a solvent mixture, of at least two solvents selected from this group. In another embodiment, the composition also consists of, additionally, a surfactant component. This invention also relates to using either of these compositions to remove a patterned photoresist from a substrate. 

Photoresist remover compositions

The present invention relates to a composition consisting essentially of a sulfonic acid component selected from the group consisting of camphor sulfonic acid, and a benzene sulfonic acid of structure (I), wherein R is H or a C-1 to C-18 n-alkyl, oxalic acid, a solvent component which consists essentially of an organic solvent component, or a mixture of an organic solvent components and water, wherein the organic solvent component consist of about 100 wt % to about 85 wt % of said solvent component, and further wherein said organic solvent component is either selected from solvent (III), (IV), (V), (VI) (wherein R is selected from the group consisting of &#x2014;(-0-CH&#x2014;CH&#x2014;), &#x2014;OH, &#x2014;OH, and -0-C(&#x2550;O)&#x2014;CH, wherein n' is equal to 1, 2, 3, or 4), (VII) (wherein Ra is H or a C-1 to C-4 alkyl moiety), (VIII), (IX) (wherein Rb is a C-1 to C-18 alkyl moiety), (X), and (XI) or is a mixture, of at least two organic solvents selected from this group. The invention also relates to such compositions also containing a surfactant component, and also pertains to the process of using either of these compositions as a resist remover. Dipropylene glycol monomethyl ether (III), 

Disclosed and claimed herein is a template for directing a pattern in a block copolymer film and the process of making the pattern.

Template for self assembly and method of making a self assembled pattern

The present invention relates to a novel block copolymer of structure 1, wherein, A- is a block polymer chain, B is a block polymer chain,wherein, A- and B- are chemically different, covalently connected polymer chains, which are phase separable and the moiety X(Y(Z))is a junction group, which comprises a surface active pendant moiety Y(Z)wherein:

Block copolymers with surface-active junction groups, compositions and processes thereof

The present invention relates to non aqueous, graftable coating composition comprised of a homogenous solution of a polymer and a spin casting organic solvent, where the composition does not contain acidic compounds, coloring particles, pigments or dyes, and the polymer has a linear polymer chain structure which is comprised of repeat units derived from monomers containing a single polymerizable olefinic carbon double bond, and the polymer contains at least one triarylmethyl chalcogenide containing moiety which is selected from the group consisting of repeat units having structure (I) an end chain group unit of structure (II) and mixtures thereof, and the polymer does not contain any repeat units or end groups containing water ionizable groups, ionic groups, free thiol groups, or free hydroxy groups, and where A, A, and Aare independently an Aryl or a substituted Aryl; Y is a chalcogen selected from O, S, Se or Te; Xand Xare individually selected organic spacers; Pis an organic polymer repeat unit moiety derived from a monomer containing a single polymerizable olefinic carbon double bound, and Pis an end group moiety derived from a monomer containing a single polymerizable olefinic carbon double bound, andrepresents a direct valence bond to the linear polymer.  The invention also relates to using this novel coating composition to form a grafted polymer film on a substrate.

Compositions and use thereof for modification of substrate surfaces

The present invention relates to novel copolymers containing cross-linkable and graft-able moieties, novel compositions comprised of these novel copolymers and a solvent, and methods for using these novel compositions to form neutral layer films which are both cross-linked and grafted on the substrate which are used in processes for aligning microdomains of block copolymers (BCP) on this neutral layer coated substrate such as self-assembly and directed self-assembly. The novel compositions are comprised of at least one novel random copolymer comprised of least one unit of structure (1), at least one unit of structure (2) at least one unit of structure (3) oneH end group and one end group having structure (1'); where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl, C-Cpartially fluorinated alkyl moiety, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl moiety and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3, and n&#x2032; ranges from 1 to 5, and n&#x2033; ranges from 1 to 5, n&#x2032;&#x2033; ranges from 1 to 5, Ris a Cto Calkyl and X is &#x2014;CN, or an alkyloxycarbonyl moiety R&#x2014;O&#x2014;(C&#x2550;O)&#x2014; where Ris a Cto Calkyl andrepresent the attachment point of the end group to the polymer. The novel polymers, compositions and processes are useful for fabrication of electronic devices.

Compositions and processes for self-assembly of block copolymers

The present invention relates to a novel diblock copolymer comprising a repeat unit (1) and a repeat unit (2), where Ris hydrogen or C-Calkyl, Ris selected from a group chosen from hydrogen, C-Calkyl, C-Calkoxy and halide, Ris selected from a group chosen from hydrogen, C-Calkyl and C-Cfluoroalkyl, and R, R, R, R, R, R, R, R, and Rare independently chosen from a C-Calkyl and n=1-6.  The invention also relates to a novel composition comprising the novel polymer and a solvent. The invention further relates to a process utilizing the novel composition for affecting directed self-assembly of the block copolymer.

Silicon containing block copolymers for direct self-assembly application

Disclosed herein is an underlayer composition, wherein the underlayer is typically used for promoting the formation of self assembled structures, and wherein the underlayer formulation comprises: (a) a polymer comprising at least one monomer repeat unit having the structure (I) wherein X is a crosslinking group chosen from and wherein n is 0-5, p is 0-5, q is 1-2, m is 1-2 and R is H, C-Calkyl or tri(C-Calkyl)silyl; (b) at least one thermal acid generator; and (c) a solvent. The invention further relates to methods of making and using the composition.

Underlayer composition for promoting self assembly and method of making and using

The present invention relates to a novel antireflective coating composition comprising a polymer obtained from a reaction product of at least one amino compound chosen from the group consisting of a polymer with repeat unit of structure (1), structure (2) and mixtures thereof reacted with a hydroxy compound chosen from the group consisting of structure (3), structure (4) and mixtures thereof, and, a thermal acid generator. The invention also relates to a process for using the novel composition in lithography.

Antireflective compositions and methods of using same

Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I): wherein R is chosen from H, C-Calkyl, or halogen, and W is a divalent group chosen from C-Calkylene, C-Carylene, benzylene, or C-Calkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.

The present invention relates to novel processes for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The processes are useful for fabrication of electronic devices. The novel processes comprise a step of forming a coating of the neutral layer from the neutral layer composition, wherein the neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl moiety, C-Cpartially fluorinated alkyl, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3.

Compositions of neutral layer for directed self assembly block copolymers and processes thereof

The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein Rrepresents a C-Csubstituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Ris a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.

Neutral layer polymer composition for directed self assembly and processes thereof

The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl moiety, C-Cpartially fluorinated alkyl, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3.

The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.

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Whitehouse Station, NJ, United States of America

Guanyang Lin