Boe Technology Group Co., Ltd.

Chengdu Boe Optoelectronics Technology Co., Ltd.

Guangzhou Zhao

Yiyang Zhang

Yi Zhang

Weiyun Huang

Yue Long

Tingliang Liu

Zhen Zhang

Yang Zhou

Pengfei Yu

Junjie Zhao

Linhong Han

Yuqing Yang

Yanxia Xin

Qun Ma

Gong Chen

Zheng Bao

Shikai Qin

Hongwei Hu

Xiping Li

Xudong An

Yihao Wu

Provided are a display motherboard, a preparation method thereof, a display substrate and a display device. The display motherboard includes a plurality of display substrate regions and a cutting region located at a periphery of each of the plurality of display substrate regions; the display motherboard includes a driving structure layer arranged in each of the plurality of display substrate regions and a marking structure layer arranged in each cutting region, wherein the marking structure layer includes a cutting mark layer; and a planarization layer arranged on the driving structure layer and the marking structure layer, and covering the marking structure layer.

Display motherboard, preparation method thereof, display substrate and display device

Embodiments of the present disclosure provide a thin film transistor, a method for manufacturing a thin film transistor, an array substrate, a display panel, and a display device. The thin film transistor includes: a base substrate; an active layer, an insulating layer, and a source-drain layer sequentially stacked on the base substrate, wherein the source-drain layer is electrically connected to the active layer through a via hole penetrating the insulating layer; and a transition layer arranged between the source-drain layer and the active layer at a position of the via hole, wherein the transition layer covers a bottom of the via hole and covers at least part of a sidewall of the via hole, and the transition layer comprises elements of the active layer and elements of a part of the source-drain layer, the part of the source-drain layer being in contact with the transition layer.

Thin film transistor and method for manufacturing the same, array substrate, display panel, and display device

A method of fabricating a substrate is provided. The method of fabricating the substrate includes forming a first conductive pattern; forming a first insulating layer, and forming a first blind hole in the first insulating layer; forming a conductive film layer, and removing at least a portion of the conductive film layer in the first blind hole; thinning a portion of the first insulating layer at a bottom of the first blind hole to form a second blind hole; forming an intermediate insulating layer, and forming a second via hole in the intermediate insulating layer; removing the portion of the first insulating layer and forming a first via hole in the first insulating pattern layer; and forming a second conductive pattern. The second conductive pattern directly contacts the first conductive pattern through the first via hole and the second via hole and insulates from the intermediate conductive pattern.

Substrate and fabricating method thereof, and display apparatus

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Beijing, China

Guangzhou Zhao