L'air Liquide, Soci&#xe9;t&#xe9; Anonyme Pour L'etude Et L'exploitation Des Proc&#xe9;d&#xe9;s Georges Claude

American Air Liquide, Inc.

Grigory Nikiforov

Gennadiy Itov

Jean-Marc Girard

Antonio Sanchez

Nicolas Blasco

Guillaume Husson

Yang Wang

Peng Zhang

Manish Khandelwal

Reno Pesaresi

David Orban

Satoko Gatineau

Zhiwen Wan

Yumin Liu

Glenn Kuchenbeiser

Feng Li

Matthew Damien Stephens

Sean Kerrigan

Claudia Fafard

Cole Ritter

Stefan Wiese

Bin Sui

Jian Hou

A method for synthesis of Pt(PF)(CAS #19529-53-4), the method comprising the steps of forming a suspension of a platinum precursor Pt(Hal), wherein Hal=F, Cl, Br or I, and a metal powder in a solvent, introducing excess amount of PFinto the suspension of Pt(Hal)and the metal powder, forming a soluble reaction intermediate Pt(Hal)(PF)in the solvent through a reaction between PFand Pt(Hal), wherein Hal=F, Cl, Br or I, x=1, 2, under a reaction condition, and forming Pt(PF)from a reaction between Pt(Hal)(PF), the metal powder and the excess of PFin the solvent.

Low pressure process for synthesis of Pt(PF)involving a soluble intermediate and storage of obtained Pt(PF)

A metal cyclopentadienyl complex has the formula: wherein m≥0; M is a Group I, II or III main group metal, alkali or transition metal; CHrepresents a Cp ring where two hydrogens are substituted by M and R(F); R(F)is connected to any one of the carbon atoms of the Cp and selected from a hydrocarbyl, fluorohydrocarbyl, silyl group [SiR'], or amino group [—NRR]. The metal cyclopentadienyl complexes include Li(CH-2-CH) (CAS No: 2413046-23-6), K(CH-2-CH), Na(CH-2-CH), K(CH-1-F—CH), K(CH-1,1,1-3F—CH), Li(CH-2-CH), or In(CH-2-CH) (CAS No.: 2364634-67-1). A mono-substituted cyclopentadiene has the formula: wherein m≥0; CHrepresents the Cp ring where one hydrogen is substituted R(F); R(F)is connected to any one of the carbon atoms of the Cp and selected from a hydrocarbyl, fluorohydrocarbyl, silyl group [SiR'], or amino group [—NRR]. The mono-substituted cyclopentadienes include CH-1-F—CH, CH-2-CH, CH-2-CH, or CH-1,1,1-3F—CH.

Mono-substituted cyclopentadienes and metal cyclopentadienyl complexes and synthesis methods thereof

Methods for producing halosilazane comprise halogenating a hydrosilazane with a halogenating agent to produce the halosilazane, the halosilazane having a formula(SiH(NR)X)N(SiHX),wherein each a, b, c is independently 0 to 3; a+b+c=3; d is 0 to 2 and n&#x2265;1; wherein X is selected from a halogen atom selected from F, Cl, Br or I; each R is selected from H, a C-Clinear or branched, saturated or unsaturated hydrocarbyl group, or a silyl group [SiR']; further wherein each R&#x2032; of the [SiR&#x2032;] is independently selected from H, a halogen atom selected from F, Cl, Br or I, a C-Csaturated or unsaturated hydrocarbyl group, a C-Csaturated or unsaturated alkoxy group, or an amino group [&#x2014;NRR] with each Rand Rbeing further selected from H or a C-Clinear or branched, saturated or unsaturated hydrocarbyl group, provided that when c=0, d&#x2260;0; or d=0, c&#x2260;0.

Si-containing film forming precursors and methods of using the same

A Si-containing film forming composition comprising a catalyst and/or a polysilane and a N&#x2014;H free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising N&#x2014;H free repeating units having the formula [&#x2014;N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y=0, 1, or 2 with x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 with x+y=3. Also disclosed are synthesis methods and applications for using the same.

Perhydropolysilazane compositions and methods for forming oxide films using same

A method for synthesizing Pt(PF)(CAS # 19529-53-4) comprises dissolving a platinum compound having a general formula, Pt(Hal)(PF), in an anhydrous solvent forming a Pt(Hal)(PF)solution, wherein Hal=F, Cl, Br or I, x=1, 2, adding a metal powder and excess amount of PFinto the Pt(Hal)(PF)solution, and forming Pt(PF)through a reaction between Pt(Hal)(PF), PFand the metal powder under a reaction condition. The method further comprises synthesizing Pt(Hal)(PF)through the steps of dispersing a platinum precursor having a general formula, Pt(Hal), into the anhydrous solvent forming a suspension of Pt(Hal), wherein Hal=F, Cl, Br or I, introducing PFinto the suspension of Pt(Hal), and forming the solution of the platinum compound Pt(Hal)(PF)in the anhydrous solvent through a reaction of PFand Pt(Hal).

Methods of selectively synthesizing n-tetrasilane are disclosed. N-tetrasilane is prepared by catalysis of silane (SiH), disilane (SiH), trisilane (SiH), or mixtures thereof. More particularly, the disclosed synthesis methods tune and optimize the n-tetrasilane:i-tetrasilane isomer ratio. The isomer ratio may be optimized by selection of process parameters, such as temperature and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of n-tetrasilane.

Process for producing isomer enriched higher silanes

Synthesis of silanes with more than three silicon atoms are disclosed (i.e., SiHwith n=4-100). More particularly, the disclosed synthesis methods tune and optimize the isomer ratio by selection of process parameters such as temperature, residence time, and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of silanes containing more than three silicon atoms and particularly, the silanes containing preferably one major isomer. The pure isomers and isomer enriched mixtures are prepared by catalytic transformation of silane (SiH), disilane (SiH), trisilane (SiH), and mixtures thereof.

Process for producing liquid polysilanes and isomer enriched higher silanes

Disclosed are mono-substituted cyclopentadienes, metal cyclopentadienyl complexes and methods for synthesizing them. The disclosed mono-substituted cyclopentadienes are synthesized by a selective catalytic carbon-carbon coupling reaction. The disclosed metal cyclopentadienyl complexes are synthesized from the disclosed mono-substituted cyclopentadienes. The disclosed metal cyclopentadienyl complexes include main group metal and transition metal cyclopentadienyl complexes, and may be used as deposition precursors contained in film forming compositions for film depositions in semiconductor industry, such as ALD, CVD, SOD, etc.

Methods of selectively synthesizing n-tetrasilane are disclosed. N-tetrasilane is prepared by pyrolysis of silane (SiH), disilane (SiH), trisilane (SiH), or mixtures thereof. More particularly, the disclosed synthesis methods tune and optimize the n-tetrasilane:i-tetrasilane isomer ratio. The isomer ratio may be optimized by selection of process parameters, such as temperature, residence time, and the relative amount of starting compounds. The disclosed synthesis methods allow facile preparation of n-tetrasilane.

Disclosed are methods of synthesizing and using Titanium-containing film forming compositions comprising titanium halide-containing precursors to deposit Titanium-containing films on one or more substrates via vapor deposition processes.

Titanium-containing film forming compositions for vapor deposition of titanium-containing films

Methods for halogenation of a hydrosilazane include contacting the hydrosilazane with a halogenating agent in a liquid phase to produce the halosilazane having a formula(SiH(NR)X)N(SiHX),wherein each a, b, c is independently 0 to 3; a+b+c=3; d is 0 to 2 and n&#x2265;1; wherein X is selected from a halogen atom selected from F, Cl, Br or I; each R is selected from H, a C-Clinear or branched, saturated or unsaturated hydrocarbyl group, or a silyl group [SiR']; further wherein each R&#x2032; of the [SiR&#x2032;] is independently selected from H, a halogen atom selected from F, Cl, Br or I, a C-Csaturated or unsaturated hydrocarbyl group, a C-Csaturated or unsaturated alkoxy group, or an amino group [&#x2014;NRR] with each Rand Rbeing further selected from H or a C-Clinear or branched, saturated or unsaturated hydrocarbyl group.

Synthesis of silanes with more than three silicon atoms are disclosed (i.e., (SiHwith n=4-100). More particularly, the disclosed synthesis methods tune and optimize the isomer ratio by selection of process parameters such as temperature, residence time, and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of silanes containing more than three silicon atoms and particularly, the silanes containing preferably one major isomer. The pure isomers and isomer enriched mixtures are prepared by catalytic transformation of silane (SiH), disilane (SiH), trisilane (SiH), and mixtures thereof.

Titanium-containing film forming compositions comprising titanium halide-containing precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Titanium-containing films on one or more substrates via vapor deposition processes.

Synthesis of tungsten pentahalide compositions having low impurity profiles are disclosed. The specific impurity profile permits deposition of high purity tungsten-containing films using vapor deposition processes or other semiconductor manufacturing processes without introduction of performance-impacting contaminants.

Growing community of inventors

Bridgewater, NJ, United States of America

Grigory Nikiforov