Opticomp Corporation

Gregory Pickrell

Peter S Guilfoyle

Duane Louderback

Jongwoo Kim

Duane A Loudeback

A method of manufacturing a distributed Bragg reflector (DBR) in group III-V semiconductor compounds with improved optical and electrical characteristics is provided. A selected DBR structure is achieved by sequential exposure of a substrate to predetermined combinations of the elemental sources to produce a pair of DBR layers of compound alloys and a graded region including one or more discrete additional layers between the DBR layers of intermediate alloy composition. Exposure durations and combinations of the elemental sources in each exposure are predetermined by DBR design characteristics.

Method for semiconductor compositional grading to realize low-resistance, distributed Bragg reflectors

An optical coupler comprises first and second mirrors. The first mirror is positioned with respect to the second mirror so that a resonant cavity is defined between them. A waveguide structure is positioned in the resonant cavity and includes a photonic crystal coupler. A thickness of the resonant cavity is selected so that a phase matching condition is satisfied for resonance in the resonant cavity. At least one of the first and second mirrors may be formed from a structure in an optoelectronic device. Alternatively, at least one of the first and second mirrors is formed from a semiconductor layer. At least one of the first and second mirrors may be formed as a semiconductor distributed bragg reflector, or as a dielectric distributed bragg reflector. At least one of the first and second mirrors may be a mirror in a vertical cavity surface emitting laser (VCSEL) structure. The photonic crystal coupler structure may be shaped so that first order modes of light incident upon the photonic crystal coupler structure are coupled into the waveguide while zero-order modes are reflected out into the resonant cavity and reflected by the mirror.

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Carson City, NV, United States of America

Gregory Pickrell