Dupont Photomasks, Inc.

Toppan Photomasks, Inc.

Gregory P Hughes

Franklin Dean Kalk

Joseph Stephen Gordon

Hakki Ufuk Alpay

Glenn Edward Storm

Craig A West

H Ufuk Alpay

Kent B Ibsen

A method and apparatus for calibrating a metrology tool are disclosed. The apparatus includes a substrate having at least one calibration site formed thereon. The calibration site includes a pattern of cells that have at least one feature disposed in a surface of the substrate. The feature provided for measurement by a step height metrology tool and a phase metrology tool to calibrate the step height and phase metrology tools.

Method for calibrating a metrology tool

Method and apparatus for calibrating a metrology tool

An apparatus and method for optimizing a pellicle for off-axis transmission are disclosed. A pellicle includes a thin film optimized for transmission of off-axis incident light at a desired angle. The pellicle further includes an optical thickness greater than a design thickness by less than or equal to approximately one-quarter of an exposure wavelength.

Apparatus and method for optimizing a pellicle for off-axis transmission of light

A method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism are disclosed. A pellicle is coupled to a photomask with a non-distorting mechanism that is located on a pellicle frame opposite a thin film coupled to the pellicle frame. The non-distorting mechanism acts to reduce stress exerted on the photomask by the pellicle.

Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism

A method and apparatus for calibrating a metrology tool are disclosed. The method includes measuring a parameter of a contrast enhanced feature on an artifact using a metrology tool, where the contrast enhanced feature reduces random errors in the metrology tool during the measuring process. The measured parameter is compared with an initial parameter associated with the artifact and the metrology tool is adjusted until the measured parameter matches the initial parameter.

A method for fabricating a damage resistant photomask includes forming a photomask pattern on a substrate and forming a transparent, protective coating on the photomask pattern. The protective coating may be an electrical insulator (e.g., spin-on glass). In addition, an antireflective layer may be applied to the protective coating. A pellicle may also be attached over the protective coating. The protective coating may prevent electrostatic energy from forming on or arcing between features on the photomask pattern and damaging the features. The protective layer may also prevent the photomask pattern from being damaged by or reacting with other substances, such as cleaning solutions.

Damage resistant photomask construction

A photomask and a method for forming an opaque border on the same are disclosed. In an example method of manufacturing a photomask, no more than one patterning operation is used to form a mask field with an opaque border substantially surrounding the mask field. The border region may be substantially covered by an opaque material, and features in the mask field may be free from the opaque material. When the photomask is used to expose a pattern on an object, the opaque border may substantially prevent electromagnetic radiation (EMR) from exposing portions of the object outside the field of exposure associated with the mask field. The operation of forming the mask field may include forming an insulating clear region surrounding the features and leaving the border region outside the insulating clear region. The opaque layer may be deposited by electroplating or spraying an opaque material onto the border region.

Growing community of inventors

Austin, TX, United States of America

Gregory P Hughes