Harris Corporation

University of Central Florida Research Foundation Inc

Gregory Michael Shimkaveg

Charles Michael Newton

William Thomas Silfvast

Carol Ann Gamlen

John DeSalvo

John Richard Desalvo

William T Silfvast

Mark A Klosner

William Thonas Silfvast

A method is provided for decontaminating biological pathogens residing in an enclosure of an electronic device. The method includes: identifying materials used to encase the enclosure of the electronic device; tailoring x-ray radiation to penetrate the materials encasing the enclosure; and directing x-ray radiation having a diffused radiation angle towards the electronic device.

System and method for non-destructive decontamination of sensitive electronics using soft x-ray radiation

A pixel array arrangement is provided for a soft x-ray source. The arrangement includes: a window-frame structure having a plurality of channels passing therethrough, where each channel forms a pixel for the x-ray source; a cathode disposed on one side of each channel in the window-frame structure and operable to emit electrons into the channel; and an anode disposed in each cavity on an opposing side of the channel from the cathode and operable to emit x-ray radiation when electrons from the cathode impinge thereon, where the anode is configured to emit x-ray radiation at a diffused angle such that the x-ray radiation from a given pixel overlaps with x-ray radiation from adjacent pixels.

Pixel array arrangement for a soft x-ray source

System and method for non-destructive decontamination of sensitive electronics using soft X-ray radiation

A method is provided for decontaminating biological pathogens in a contaminated environment. The method includes: tailoring x-ray radiation to match the absorption characteristics of a contaminated environment; generating x-ray radiation having a diffused radiation angle in accordance with the absorption characteristics of the contaminated environment; and directing the x-ray radiation towards the contaminated environment.

Soft x-ray radiation for biological pathogen decontamination and medical sterilization applications

Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.

Capillary discharge extreme ultraviolet lamp source for EUV

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Oviedo, FL, United States of America

Gregory Michael Shimkaveg