Asml Netherlands B.v.

Gregory Martin Mason Corcoran

Thibault Simon Mathieu Laurent

Ruud Hendrikus Martinus Johannes Bloks

Johan Gertrudis Cornelis Kunnen

Ronald Van Der Ham

Koen Steffens

Takeshi Kaneko

Raymond Wilhelmus Louis Lafarre

Ivo Adam Johannes Thomas

Gerben Pieterse

Robbert Jan Voogd

Bastiaan Andreas Wilhelmus Hubertus Knarren

Gerardus Adrianus Antonius Maria Kusters

Ramin Badie

Pieter Lein Joseph Gunter

Coen Cornelis Wilhelmus Verspaget

Johannes Henricus Wilhelmus Jacobs

Martijn Houben

Sander Catharina Reinier Derks

Jimmy Matheus Wilhelmus Van De Winkel

Marinus Jan Remie

Henrikus Herman Marie Cox

Frank Johannes Jacobus Van Boxtel

Theodorus Wilhelmus Polet

Wilhelmus Franciscus Johannes Simons

Erik Henricus Egidius Catharina Eummelen

Paul Petrus Joannes Berkvens

Ronald Casper Kunst

Christophe De Metsenaere

Mauritius Gerardus Elisabeth Schneiders

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Lithographic apparatus and method

A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

Lithographic apparatus and a device manufacturing method

A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.

Immersion lithographic apparatus including a pressure sensor to measure pressure of the immersion liquid and a device manufacturing method

A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.

Fluid handling device, an immersion lithographic apparatus and a device manufacturing method

Growing community of inventors

Eindhoven, Netherlands

Gregory Martin Mason Corcoran