Bell Communications Research, Inc.

Gregory L Baker

Cynthia F Klausner

Janet L Jackel

Antoni S Gozdz

Jayantilal S Patel

Murrae J Bowden

Sin-Doo Lee

Nicholas E Schlotter

A technique for the preparation of an oriented thin film polydiacetylene suitable for use in channel waveguides involves depositing an alignment polymer upon a substrate, rubbing the surface thereof to effect orientation, depositing the polydiacetylene thereon and heating to a temperature just below the melting point thereof.

Technique for epitaxial growth of oriented thin films of polydiacetylenes

A sensitive deep utltraviolet radiation resist suitable for use in two layer lithography is obtained by brominating poly (1-trimethylsilylpropyne). Positive patterned layers are obtained by coating a substrate with the polymer, irradiating it with ultraviolet radiation, baking the polymer and developing the irradiated portions.

Silicon-containing polymers as resists

A channel waveguide structure comprises a substrate, a channel pattern defined in the substrate adjacent the top surface of the substrate, and a planar film layer on top substrate. The channel pattern comprises channels having a high index of refraction, while the film layer is made from a nonlinear organic material. In a preferred embodiment, the substrate is glass and the channel pattern comprises ion-exchanged channels. In this preferred embodiment, the nonlinear organic material is a soluble polydiacetylene, such as poly(3BCMU), poly(4BCMU), or poly(TS12). The thicknesses of the ion-exchanged channels and of the film layer can be adjusted so that the channel waveguide structure functions as a single mode waveguide for light having a wavelength in the range of 1.3 to 1.67 microns.

Composite channel waveguides

Novel optical waveguides and methods for their fabrication are provided. The waveguides are made from polydiacetylene materials. The waveguides are made by a bilayer process wherein a film made from a soluble polydiacetylene material is applied to a substrate and a silicon-containing imaging layer is applied atop the polyacetylene layer. Thereafter a pattern is produced in the imaging layer, for example, by photolithographic methods, and the pattern is transferred to the underlying polydiacetylene layer by exposure to an oxygen plasma. Polydiacetylene waveguides greater than 0.4 microns thickness are thereby produced.

Growing community of inventors

Tinton Falls, NJ, United States of America

Gregory L Baker