Surface Logix, Inc.

Applied Materials, Inc.

Kla Tencor Corporation

Kla-tencor Technologies Corporation

Gregory Kirk

Olivier Schueller

Enoch Kim

Emanuele Ostuni

Paul Sweetnam

Matthew L Brown

David C Duffy

Stewart Campbell

Bernardo D Aumond

Brian Benoit

Melina Amber Agosto

Mehdi Vaez-Iravani

Samer Banna

Todd J Egan

Aaron Raphel

Yaoming Shen

Abraham Ravid

Kyle Tantiwong

Shiow-Hwei Hwang

Gary E Dickerson

Seng (victor) Keong Lim

Michael Robert Rice

Vijay D Parkhe

David R Shafer

Hwan J Jeong

Michael B Nussbaum

Isabella Talley Lewis

Leon Volfovski

Wendell Glenn Boyd, Jr

Matthew Derstine

Matthew James Busche

Robert M Danen

Steven R Lange

Prashant Aji

Rocco Casagrande

Evelyn Wang

Russel Hudyma

Stephane Durant

A system for processing a substrate is provided. The system includes a process chamber including one or more sidewalls enclosing a processing region; and a substrate support. The system further includes a passageway connected to the process chamber; and a first particle detector disposed at a first location along the passageway. The first particle detector includes an energy source configured to emit a first beam; one or more optical devices configured to direct the first beam along one or more paths, where the one or more paths extend through at least a portion of the passageway. The first particle detector further includes a first energy detector disposed at a location other than on the one or more paths. The system further includes a controller configured to communicate with the first particle detector, wherein the controller is configured to identify a fault based on signals received from the first particle detector.

Particle detection for substrate processing

Substrate temperature control apparatus and electronic device manufacturing systems provide pixelated light-based heating to a substrate in a process chamber. A substrate holder in the process chamber may include a baseplate. The baseplate has a top surface that may have a plurality of cavities and a plurality of grooves connected to the cavities. Optical fibers may be received in the grooves such that each cavity has a respective optical fiber terminating therein to transfer light thereto. Some or all of the cavities may have an epoxy optical diffuser disposed therein to diffuse light provided by the optical fiber. A ceramic plate upon which a substrate may be placed may be bonded to the baseplate. A thermal spreader plate may optionally be provided between the baseplate and the ceramic plate. Methods of controlling temperature across a substrate holder in an electronic device manufacturing system are also provided, as are other aspects.

Apparatus, systems, and methods for temperature control of substrates using embedded fiber optics and epoxy optical diffusers

Embodiments of the present disclosure relate to an apparatus and a method for reducing the adverse effects of exposing portions of an integrated circuit (IC) device to various forms of radiation during one or more operations found within the IC formation processing sequence by controlling the environment surrounding and temperature of an IC device during one or more parts of the IC formation processing sequence. The provided energy may include the delivery of radiation to a surface of a formed or a partially formed IC device during a deposition, etching, inspection or post-processing process operation. In some embodiments of the disclosure, the temperature of the substrate on which the IC device is formed is controlled to a temperature that is below room temperature (e.g., &#x3c;20&#xb0; C.) during the one or more parts of the IC formation processing sequence.

Method and apparatus for reducing radiation induced change in semiconductor structures

An optical system may include an objective having at least four mirrors including an outermost mirror with aspect ratio &#x3c;20:1 and focusing optics including a refractive optical element. The objective provides imaging at numerical aperture &#x3e;0.7, central obscuration &#x3c;35% in pupil. An objective may have two or more mirrors, one with a refractive module that seals off an outermost mirror's central opening. A broad band imaging system may include one objective and two or more imaging paths that provide imaging at numerical aperture &#x3e;0.7 and field of view &#x3e;0.8 mm. An optical imaging system may comprise an objective and two or more imaging paths. The imaging paths may provide two or more simultaneous broadband images of a sample in two or more modes. The modes may have different illumination and/or collection pupil apertures or different pixel sizes at the sample.

Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths

A method for wafer defect inspection may include, but is not limited to: providing an inspection target; applying at least one defect inspection enhancement to the inspection target; illuminating the inspection target including the at least one inspection enhancement to generate one or more inspection signals associated with one or more features of the inspection target; detecting the inspection signals; and generating one or more inspection parameters from the inspection signals. An inspection target may include, but is not limited to: at least one inspection layer; and at least one inspection enhancement layer.

Optical defect amplification for improved sensitivity on patterned layers

An inspection system for creating images of a substrate. A light source directs an incident light onto the substrate, and a light source timing control controls a pulse timing of the incident light. A stage holds the substrate and moves the substrate under the incident light, so that the substrate reflects the incident light as a reflected light. A stage position sensor reports a position of the stage, and a stage position control controls the position of the stage. A time domain integration sensor receives the reflected light, and a time domain integration sensor timing control controls a line shift of the time domain integration sensor. A control system is in communication with the light source timing control, the stage position control, and the time delay integration sensor timing control, and sets the pulse timing of the incident light, the position of the stage, and the line shift of the time delay integration sensor, such that a single line of the time domain integration sensor integrates reflected light from more than one pulse of the incident light from the light source.

Image collection

Devices and methods for performing assays on materials, particularly biological materials, are provided. The devices and methods make use of self-sealing members, which can be applied to a flat surface to form wells to facilitate immobilization of materials on the flat surface, then removed to yield a flat surface that facilitates the performance of processes on and/or detection of the immobilized material.

Peelable and resealable devices for arraying materials

A method for applying a pattern to a target surface includes the steps of applying a coating of membrane material over a selected portion of a substrate. The substrate imparts a pattern to the membrane material corresponding to a pattern to be applied to the target surface. A support member is positioned in contact with an outer portion of the membrane material. The support member has a higher rigidity than the membrane material. The method may also combine the steps of curing the membrane material to bond the support member to the membrane. When bonded to the membrane, the support member maintains at least a portion of the membrane in a substantially taut condition to prevent a portion of the membrane from folding onto itself. The membrane is then employed to impart the pattern to the target surface.

Apparatus and method for handling membranes

A device for monitoring leukocyte migration is provided. The invention also provides a method of using the device to monitor leukocyte migration in the presence of physiological shear flow and therefore simulate physiological conditions of a blood vessel in vivo. The invention further provides a method of using the device to high-throughput screen a plurality of test agents. The present invention further provides a flexible assay system and numerous assays that can be used to test biological interactions and systems. Laminar flow gradients are employed that mimic gradient situations present in vivo.

Device and method for monitoring leukocyte migration

The present invention discloses a device for monitoring chemotaxis or chemoinvasion. The present invention further provides a flexible assay system and numerous assays that can be used to test biological interactions and systems. Laminar flow gradients are employed that mimic gradient situations present in vivo.

Biological assays using gradients formed in microfluidic systems

Peelable and resealable devices for biochemical assays

The present invention discloses a device for monitoring haptotaxis including a housing defining a chamber. The chamber comprises: a first well region including at least one first well, the first well configured to receive a test agent therein and further including biomolecules immobilized therein; a second well region including at least one second well, the second well region configured to receive a sample comprising cells therein and further being horizontally offset with respect to the first well region in a test orientation of the device; and a channel region including at a least one channel connecting the first well region and the second well region with one another, the channel region further including biomolecules immobilized therein.

Device for monitoring haptotaxis

Methods for processing biological materials using peelable and resealable devices

Growing community of inventors

Winchester, MA, United States of America

Gregory Kirk