Arch Specialty Chemicals, Inc.

Gregory Domenic Spaziano

Patrick Foster

Andrew J Blakeney

Binod B De

John Joseph Biafore

Sanjay Malik

Thomas Steinhausler

Sidney George Slater

Ognian N Dimov

Lawrence Ferreira

J Thomas Kocab

John P Hatfield

Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure Iwhere Ris a moiety containing an ethylenically unsaturated polymerizable group, Ris a C-Calkylene group, and Ris a Clinear or cyclic alkyl group, a Caromatic or substituted aromatic group, a Calkoxy methyl, or a Calkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.

Photosensitive bilayer composition

Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula:wherein Ris H or methyl; Ris a substituted or unsubstituted C-Caryl acrylate or C-Caryl methacrylate group wherein the substituted groups may be phenyl, Calkyl or Calkoxy; Ris a hydroxyl functionalized C-Calkyl acrylate, methacrylate or C-Caryl group, Ris a C-Clinear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [&#x2014;RO&#x2014;]; Ris a C-Clinear, branched or cyclic alkyl, substituted or unsubstituted C-Caryl, or substituted or unsubstituted C-Calicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.

Thermally cured underlayer for lithographic application

A photoacid compound having the following general structure:R&#x2014;O(CF)SOXwherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C-Clinear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF)O)(CF)&#x2014; wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.

Photoacid generators for use in photoresist compositions

Radiation sensitive resins for use in a top layer resists in bilayer systems for use in deep UV photolithography comprises copolymers having the following structural units: ##STR1## and optionally, ##STR2## wherein n is an integer of 1 to 5, R.sup.1 is methyl or trimethylsiloxy, R.sup.2 is a tert-butyl group, R.sup.3, R.sup.4 and R.sup.5 are each independently hydrogen or a methyl group.

Radiation sensitive copolymers, photoresist compositions thereof and

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Providence, RI, United States of America

Gregory Domenic Spaziano