The State University of New York

University of New York

Gregory Denbeaux

John G Hartley

Junru Ruan

Photoresist layers of semiconductor components including electric fields. The photoresist layer may include a body including a first portion disposed directly over a conductive layer of the semiconductor component. The body may also include a second portion integrally formed with and positioned over the first portion. The second portion may include a surface formed opposite the first portion. Additionally, the second portion may include a plurality of charged-particles implanted therein, where the plurality of charged-particles generating an electric field may extend through the first portion and the second portion of the body.

Photoresist layers of semiconductor components including electric fields, system, and methods of forming same

Systems for detecting, capturing, and/or measuring nanoparticles. The system may include a first vacuum chamber, where nanoparticles are formed inside a first cavity of the first vacuum. The system may also include a second vacuum chamber in fluid communication with the first vacuum chamber, a particle collection component positioned within a second cavity of the second vacuum chamber, and a particle collection medium disposed over the particle collection component. Additionally, the system may include a particle counter in fluid communication with the second vacuum chamber, and a control system operably coupled to the component. The control system may be configured to aerosolize the nanoparticles by adjusting a temperature of the component to a first temperature that establishes the medium in the solid phase, and adjusting the temperature of the component to a second temperature to transition the medium from the solid phase to a gaseous phase.

Systems and methods for detecting particles

A multiple-deflection blanker for charged particle beam lithography includes a support structure, a first pair of electrodes mounted to the support structure and providing a first electric field, a second pair of electrodes mounted to the support structure and providing a second electric field, at least a third pair of electrodes mounted to the support structure and providing a third electric field, and a surface, such as, an aperture or knife edge, positioned to obstruct a charged particle beam passed through the electric fields. The blanker may include at least a fourth pair of electrodes providing a fourth electric field and apparatus for regulating the time of the excitation of the electric fields. Methods for exposing media to charged particles and aperture holders are also provided.

Growing community of inventors

Albany, NY, United States of America

Gregory Denbeaux