International Business Machines Corporation

Kabushiki Kaisha Toshiba

Siemens Aktiengesellschaft

UChicago Argonne, LLC

Brookhaven Science Associates, Lcc

Gregory Brian Stephenson

Jorg M Maser

James Gardner Ryan

Katsuya Okumura

Deming Shu

Raymond P Conley

Curt Alfred Preissner

Barry Lai

Franz Stefan Vogt

Albert Macrander

Chian Qian Liu

Hanfei Yan

Hyon Chol Kang

Hans-Joerg Timme

Martin V Holt

Robert P Winarski

A multilayer Laue Lens includes a compensation layer formed in between a first multilayer section and a second multilayer section. Each of the first and second multilayer sections includes a plurality of alternating layers made of a pair of different materials. Also, the thickness of layers of the first multilayer section is monotonically increased so that a layer adjacent the substrate has a minimum thickness, and the thickness of layers of the second multilayer section is monotonically decreased so that a layer adjacent the compensation layer has a maximum thickness. In particular, the compensation layer of the multilayer Laue lens has an in-plane thickness gradient laterally offset by 90&#xb0; as compared to other layers in the first and second multilayer sections, thereby eliminating the strict requirement of the placement error.

Zone compensated multilayer laue lens and apparatus and method of fabricating the same

A multifunctional hard x-ray nanoprobe instrument for characterization of nanoscale materials and devices includes a scanning probe mode with a full field transmission mode. The scanning probe mode provides fluorescence spectroscopy and diffraction contrast imaging. The full field transmission mode allows two-dimensional (2-D) imaging and tomography. The nanoprobe instrument includes zone plate optics for focusing and imaging. The nanoprobe instrument includes a stage group for positioning the zone plate optics. The nanoprobe instrument includes a specimen stage group for positioning the specimen. An enhanced laser Doppler displacement meter (LDDM) system provides two-dimensional differential displacement measurement in a range of nanometer resolution between the zone-plate optics and the sample holder. A digital signal processor (DSP) implements a real-time closed-loop feedback technique for providing differential vibration control between the zone-plate optics and the sample holder.

Optomechanical structure for a multifunctional hard x-ray nanoprobe instrument

A non-contact in-situ temperature measurement apparatus for a single crystal substrate such as a semiconductor wafer using X-ray diffraction. Utilizing the Bragg condition for X-ray diffraction, the lattice constant of the semiconductor substrate can be determined either by measuring the diffraction angle for a monochromatic X-ray (monochromatic approach) or by measuring the wavelength of an X-ray diffracted with a certain scattering angle (polychromatic approach). The lattice constant, as a well-known function of temperature, is finally converted into the temperature of the semiconductor substrate.

In-situ temperature measurement using X-ray diffraction

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Lisle, IL, United States of America

Gregory Brian Stephenson