Lam Research Corporation

Gregory A Tomasch

Arnold Kholodenko

Anwar Husain

Tony Ray Kroeker

Cheng-Yu (Sean) Lin

Leon Ginzburg

Mark Mandelboym

Andreas Fischer

Cheng-Yu Lin

Babak Kadkhodayan

Tienyu T Sheng

In an example embodiment, a linear wet system includes a carrier and a proximity head in a chamber. The proximity head includes three sections in a linear arrangement. The first section suctions liquid from the upper surface of a semiconductor wafer as the wafer is transported by the carrier under the proximity head. The second section is configured to cause a film (or meniscus) of cleaning foam which is a non-Newtonian fluid to flow onto the upper surface of the wafer. The third section is configured to cause a film of rinsing fluid to flow onto the upper surface of the wafer as the wafer is carried under the proximity head. The third section is defined partially around the second section and up to the first section, so that the third section and the first section create a confinement of the cleaning foam with respect to the chamber.

Confinement of foam delivered by a proximity head

A head for dispensing a thin film over a substrate is disclosed. The head includes a body assembly that extends between a first and a second end that is at least a width of the substrate. The body includes a main bore that is defined between the first and the second ends, the main bore connected to an upper side of a reservoir through a plurality of feeds that are defined between the main bore and the reservoir. The body also includes a plurality of outlets connected to a lower side of the reservoir and extend to an output slot. The plurality of feeds have a larger cross-sectional area than the plurality of outlets and the plurality of feeds are fewer than the plurality of outlets. Wherein fluid is configured to flow through the main bore, through the plurality of feeds along the bore and fill the reservoir up to at least the threshold level before fluid is evenly output as a film out of the output slot onto the substrate.

Single substrate processing head for particle removal using low viscosity fluid

A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.

Method for using generator for foam to clean substrate

In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas is injected to form a foam. In an example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. The plug also includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a helical channel through which the foam flows and is further mixed on its way back into the cleaning system.

Generator for foam to clean substrate

A unitary slot valve actuator is in a vacuum body between process and transport modules. A separate valve is provided on the unitary actuator for each of two valve slots, each slot being closed or opened according to the position of the unitary actuator. The separate valves allow a vacuum condition to be maintained in the transport module while an adjacent process module is open to the atmosphere for servicing. Access to both open valves for servicing is by centering the unitary actuator to hold both valves open, but not vertically-spaced, relative to the slots. The open valves are easily reached by a service worker through an access port. A computer workstation operates a controller for the slot closure, and for moving the unitary actuator and the valves from the open and centered position, away from the slots to expose seal surfaces around the slots for cleaning.

Unitary slot valve actuator with dual valves

A unitary slot valve actuator is in a vacuum body between adjacent vacuum chambers, such as process and transport modules. Separate valves are provided on the unitary actuator for each of two valve slots, each slot being closed or opened according to the position of the unitary actuator. The separate valves allow a vacuum condition to be maintained in the transport module while an adjacent process module is open to the atmosphere for servicing. The unitary actuator allows access to an open valve for servicing the open valve by way of a centering mechanism that holds the valves in an open, but not vertically-spaced, position relative to the slots. The open valves are easily reached by a service worker. A separate motor moves the unitary actuator and the valves down from the open position and away from the slots to expose seal surfaces around the slots for cleaning.

A unitary slot valve actuator is in a vacuum body between adjacent vacuum chambers, such as a process module and a transport module. Separate valves are provided on the unitary actuator for each of two valve body slots, each body slot being closed or opened according to the position of the unitary actuator. The separate valves allow a vacuum condition to be maintained in the transport module while an adjacent process module is open to the atmosphere for servicing. The unitary actuator allows access to an open valve for servicing the open valve by way of a resilient bias assembly that releasably holds the valves in an open, but not vertically-spaced, position relative to the respective slots. The open valves are easily reached by a gloved hand of a service worker. A separate actuator motor moves the unitary actuator with the valves vertically down from the open position and away from the slots to expose seal surfaces around the slots for cleaning.

A single slot valve shaft is in a vacuum body between adjacent vacuum chambers, such as a process module and a transport module. Separate valves are provided on the single shaft actuator for each of two valve body slots, each body slot being closed or opened according to the position of the single shaft. The separate valves allow a vacuum condition to be maintained in the transport module while an adjacent process module is open to the atmosphere for servicing. The single shaft allows access to an open valve for servicing the open valve by way of stops that limit drive travel and hold the valve in an open, but not vertically-spaced, position relative to a respective slot. The open valve is easily reached by a gloved hand of a service worker. The single shaft is mounted on a first cradle, and the first cradle is mounted on a second cradle. Two separate shaft drives move the two cradles to position the single shaft to locate the valves between the slots to open one slot and close the other slot. Another separate shaft drive moves the single shaft vertically down from the open position and away from the slots to expose seal surfaces around the slots for cleaning.

Single shaft, dual cradle vacuum slot valve

Methods of implementing a single shaft, dual cradle vacuum slot valve

Single shaft dual cradle vacuum slot valve

A manometer resistant to chemical change caused by process chemistry used in a plasma processing chamber is provided. The manometer includes a pressure sensitive diaphragm attached to a housing wherein at least a portion of the pressure sensitive diaphragm is rendered resistant to chemical change caused by process chemistry.

Growing community of inventors

San Jose, CA, United States of America

Gregory A Tomasch