Asml Netherlands B.v.

Gregor Edward Van Baars

Michael Jozef Mathijs Renkens

Sander Frederik Wuister

Johan Frederik Dijksman

Yvonne Wendela Kruijt-Stegeman

Andre Bernardus Jeunink

Toon Hardeman

Gerard Van Schothorst

Norbert Erwin Therenzo Jansen

Catharinus De Schiffart

George Arie Jan De Fockert

Jozef Petrus Henricus Benschop

Felix Godfried Peter Peeters

Jeroen Dekkers

Rogier Ellenbroek

Maarten Steinbuch

Felix Peeters

Andreea Iuliana Rotariu

Jozef Benschop

Michael Renkens

An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Imprint lithography

A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.

Measurement of the position of a radiation beam spot in lithography

By applying time-frequency analysis to a given standard iterative learning control or ILC an adaptive filter for the learned feed-forward loop is designed. This time varying filter varies according to the momentary frequency content of the error signal and allows to discriminate between areas of deterministic and stochastic error. Its application results in selective application of ILC to those intervals where error signals of high level are concentrated and allows application of a single ILC acquisition to different setpoint trajectories. The adaptive filter finds particular use in lithographic scanning systems where it is used for varying scan length.

Method of adaptive interactive learning control and a lithographic manufacturing process and apparatus employing such a method

Growing community of inventors

Eindhoven, Netherlands

Gregor Edward Van Baars