Applied Materials, Inc.

Grant Wang

Nimrod Smith

Tsu-Hui Yang

Preston Fung

Assaf Kidron

Liang-yu Chen

Jiawei Shi

Che-Kai Chang

Davidi Kalir

Vasuman Ghanapaati Srirangarajan

Embodiments of the present disclosure relate to projection stabilization systems and maskless lithography systems having projection stabilization systems. The projection stabilization system compensates for propagating vibrations that move image projection systems (IPS's). The IPS's are in a processing position prior to operation of the maskless lithography process. One or more stiffeners are coupled to the IPS. The one or more stiffeners apply pressure to flexures coupled to each stiffener. The flexures are coupled to the IPS to provide stabilization to the IPS during the operations of the maskless lithography process. For example, the one or more of stiffeners protect the IPS from vibrations that propagate through the system during operation.

Pneumatic controlled flexure system for stabilizing a projection device

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Cupertino, CA, United States of America

Grant Wang