Other

Carl Zeiss Microscopy Gmbh

Carl Zeiss Nts Gmbh

Ims Nanofabrication Gmbh

Gottfried Hochleitner

Emmerich Bertagnolli

Daniel Fischer

Holger Doemer

Wolfram Buehler

Carl Kuebler

Heinz Wanzenboeck

Christoph Spengler

Wolf Naetar

Wolfram Buhler

Alexander Rosenthal

Holger Dömer

Wolfram Bühler

Heinz Wanzenbock

Carl Kübler

Markus Fischer

Heinz Wanzenböck

In a charged-particle lithography apparatus, during writing a desired pattern, the duration of exposure slots is adapted to compensate for fluctuations of the particle beam. In the writing process the aperture images are mutually overlapping on the target so each pixel is exposed through a number of aperture images overlapping at the respective pixel, which results in an exposure of the respective pixel through an effective pixel exposure time, i.e., the sum of durations of contributing exposure slots, and the exposure slot durations are adjusted by: The durations in step (iii) are calculated in accordance with a predetermined set of allowed durations, wherein at least one of the durations thus calculated is different from the other durations selected for said set of exposure slots.

Adapting the duration of exposure slots in multi-beam writers

A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Method of depositing protective structures

A system and a method for processing and inspecting an object are provided, wherein the system comprises a particle beam column, an object holder and a gas supply apparatus. Thereby, the object holder is formed comprising a base, a first table displaceable relative to the base, a second table displaceable relative to the first table and a third table rotatable relative to the second table, wherein the cannula of the gas supply apparatus is fixed at the first table.

System and method for processing an object

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Vienna, Austria

Gottfried Hochleitner