Ushio Denki Kabushiki Kaisha

Gota Niimi

Takahiro Hiraoka

Yusuke Teramoto

Dominik Marcel Vaudrevange

Ralf Gordon Conrads

Pieter Goldhoorn

Maghiel Jan Kole

Hironobu Yabuta

Akihisa Nagano

Wilhelmus V J Van Nunspeet

Johannes W J L Cuijpers

Andre Matthias Prinz

Disclosed herein a liquid level detection device capable of appropriately detecting a liquid level of a high temperature plasma raw material in a reservoir for storing the high temperature plasma raw material. The liquid level detection device includes: an upper limit level sensor configured to detect that the liquid level of the tin is elevated from downward to reach an upper limit level; and a refilling level sensor configured to detect that the liquid level of the tin is lowered from upward to reach a refilling level or a lower limit level. A detection responsiveness of the liquid level of the upper limit level sensor is higher than the refilling level sensor or the lower limit level sensor, and a detectability of the liquid level of the refilling level sensor or the lower limit level sensor is higher than the upper limit level sensor.

Liquid level detection device, method of detecting liquid level, high temperature plasma raw material supply device and extreme ultra violet light source device

An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.

Extreme UV radiation light source device

An arrangement for cooling a plasma-based radiation source with a metal cooling liquid and a method for starting up a cooling arrangement of this type has a pump unit for conveying the metal cooling liquid from a reservoir to an immersion bath in a pipe portion that is connected to the reservoir in the conveying direction of the cooling circuit has at least one pump for conveying the metal cooling liquid through an external field effect of the at least one pump. A control unit for controlling the at least one pump controls the at least one pump at least temporarily in a pumping direction opposite to the conveying direction of the cooling circuit in order to generate a heating effect through external field effect on metal cooling liquid located in the pipe portion.

Arrangement for cooling a plasma-based radiation source with a metal cooling liquid and method for starting up a cooling arrangement of this type

Disclosed herein a light source apparatus that is capable of suppressing a light transmission rate of a debris trap to be lowered and a reflection rate in a light condenser mirror to be lowered. In the light source apparatus, a shielding member is provided having an aperture is provided in front of a stationary type foil trap to limit a solid angle of light emitted from a high temperature plasma. Furthermore, the stationary type foil trap is provided with a driving mechanism to allow the foil trap to be revolved such that an adhesion part of the debris of the foil trap is deviated from a position of the foil trap facing the aperture.

Light source apparatus

An arrangements and methods for cooling a plasma-based radiation source having a revolving element which is to be cooled, particularly for application in EUV radiation sources, is disclosed. The revolving element is immersed in the metal coolant in a first vessel of a primary cooling circuit, and a secondary cooling circuit with a cooling liquid evaporating at the desired operating temperature of the metal coolant has a control unit for controlling at least one atomizing arrangement in a differentiated manner and for selectively controlling a heater in case the determined temperature falls below a minimum operating temperature of the metal coolant. The at least one atomizing arrangement in a cooling section selectively sprays individual wall regions of the first vessel with the cooling liquid depending on the determined temperature of the metal coolant.

Arrangement and method for cooling a plasma-based radiation source

An electrode unit of an extreme ultraviolet radiation generator comprise a breakdown voltage impression electrode, a ground electrode, an insulator provided in contact with the breakdown voltage impression electrode and the ground electrode in which plasma is generated between the discharge electrodes thereby emitting extreme ultraviolet radiation from the generated plasma, wherein at least one of the breakdown voltage impression electrode and the ground electrode includes a cooling portion which is made of copper, aluminum, or a material which contains copper, aluminum, or combination thereof as a main component and in which a passage through which a coolant passes is formed, and a discharge portion which is provided in close contact with a surface of the cooling portion, and which is made of any one of tungsten, tantalum, rhenium, molybdenum, and an alloy thereof as the a main component.

Growing community of inventors

Tokyo, Japan

Gota Niimi