Saes Pure Gas, Inc.

Saes Getters S.p.a.

Joslyn Sunbank Company LLC

Gordon P Krueger

D'Arcy H Lorimer

Andrea Conte

Sergio Carella

Ezra Phillips

A wiring connector back shell having a plurality of cable exit angles is disclosed. The back shell has a single transition element with a number of holes fashioned therein, which allow a cable retaining device to be fastened thereto. The cable retaining device provides strain relief for the cable exiting the back shell, as well as determining the exit angle of the cable. The cable retaining device has integral pins which mate with hole patterns in the transition element, and are locked in place with a retaining collar. Alternatively, cable ties or tie wraps may be utilized to fasten the cable to the transition element. The system provides a high reliability, low mass method for cable back shells wherein cable exit angles are easily changed or chosen in the field.

Connector back shells having a plurality of cable exit angles

A wafer processing system including a processing chamber, a low pressure pump coupled to the processing chamber for pumping noble and non-noble gases, a valve mechanism coupling a source of noble gas to the processing chamber, an in situ getter pump disposed within the processing chamber which pumps certain non-noble gases during the flow of the noble gas into the chamber, and a processing mechanism for processing a wafer disposed within the processing chamber. Preferably, the in situ getter pump can be operated at a number of different temperatures to preferentially pump different species of gas at those temperatures. A gas analyzer is used to automatically control the temperature of the getter pump to control the species of gasses that are pumped from the chamber. A method for processing a wafer of the present invention includes the steps of placing a wafer within a processing chamber and sealing the chamber, flowing a noble gas into the chamber while simultaneously pumping the chamber with an external low pressure pump and with an in situ getter pump disposed within the chamber which pumps non-noble gases, and processing the wafer within the chamber while the noble gas continues to flow. The method also preferably includes the steps of monitoring the composition of the gas within the chamber and controlling the temperature of the getter material based upon the analysis of the composition.

Method for processing wafers with in situ gettering

A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention the heat shields are fixed, and in other embodiments the heat shield is movable. In one embodiment, a focus shield is provided to reflect thermal energy to the getter material from an external heater element and provide high pumping speeds. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.

Getter pump module and system

An improved getter pump module includes a number of getter elements and a heating element that heats the getter elements. The getter elements are preferably porous, sintered getter disks. The heating element is disposed proximate to the getter elements and provides heat to activate the getter material and cause it to pump desired gasses. The getter elements and heater element are partially surrounded by a focus shield that is positioned between the getter elements and a wall of a processing chamber that encloses the getter elements, the heater element, and the focus shield. The focus shield is provided to reflect thermal energy to the getter material from the heater element, to provide high pumping speeds or short activation/baking times, and to reduce the heat seen by the chamber from the heating element. In certain embodiments of the present invention the focus shield is angled as to be wedge shaped, and may include planar extension portions. Multiple focus shields are provided in some embodiments.

Getter pump module and system including focus shields

Method for pumping a chamber using an in situ getter pump

In Situ getter pump system and method

A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention the heat shields are fixed, and in other embodiments the heat shield is movable. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.

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Nipomo, CA, United States of America

Gordon P Krueger