Applied Materials, Inc.

Gtat Corporation

Twin Creeks Technologies, Inc.

International Business Machines Corporation

Gopalakrishna B Prabhu

Gregory E Menk

Zhiyong Li

Garlen C Leung

Peter McReynolds

Steven M Zuniga

Erik S Rondum

Anand N Iyer

Hung Chih Chen

Robert D Tolles

Benjamin A Bonner

Steven T Mear

Christopher John Petti

Jeonghoon Oh

Theodore H Smick

Venkatesan Murali

Arulkumar P Shanmugasundram

Alexander T Schwarm

Mohamed M Hilali

Sidney P Huey

Kathy Jackson

Fred Conrad Redeker

Thomas H Osterheld

David Tanner

Robert L Jackson

Yin Yuan

Laertis Economikos

Mehdi Vaez-Iravani

Todd J Egan

Zheng Yuan

Wei-Yung Hsu

Lizhong Sun

Salvador P Umotoy

Boris Fishkin

Doyle E Bennett

Charles C Garretson

Vinay K Shah

Lin Zhang

Yong Liu

Ala Moradian

Umesh M Kelkar

Shuran Sheng

Daniel A Carl

Danny Cam Toan Lu

Karthik Ramanathan

Fen Fen Jamin

Jeffrey S Sullivan

Yacov Elgar

Garry K Kwong

Adam Zhong

Christopher Heung-Gyun Lee

James Omer L'Heureux

Tai T Ngo

Joseph F Salfelder

Donald J Delehanty

Timothy James Donohue

Dhruv Gajaria

Vasanth N Mohan

Peter McKeever

Wayne R Swart

Michael Marriott

Chuck Luu

Henry H Au

Daniel M Heenan

Mohamed H Hilali

Rohit Mahakali

John Visitacion

Peter Crundwell

Ho Gene Choi

Dennis C Pierce

Yi-Yung Tao

Srinivas R Mirmira

Joseph M Danza

Winston Y Su

Declan Liam Brett

Implementations disclosed describe, among other things, a system and a method of scanning a substrate with a beam of light and detecting for each of a set of locations of the substrate, a respective one of a set of intensity values associated with a beam of light reflected from (or transmitted through) the substrate. The detected intensity values are used to determine a profile of a thickness of the substrate.

System and method to map thickness variations of substrates in manufacturing systems

A method includes receiving measurement data from multiple sensors positioned along a delivery line that delivers a liquid as a gas to one of a gas panel or a processing chamber; simulating, using a computer-generated model, one or more process parameters associated with the delivery line and a plurality of heater jackets positioned around the delivery line; comparing the measurement data with values of the one or more process parameters; and determining, based on at least a threshold deviation between the measurement data and the values of the one or more process parameters, that a fault exists that is associated with maintaining temperature within the delivery line consistent with a gaseous state of the liquid.

Parameter sensing and computer modeling for gas delivery health monitoring

A method of controlling surface non-uniformity of a wafer in a polishing operation includes (a) providing a model for a wafer polishing that defines a plurality of regions on a wafer and identifies a wafer material removal rate in a polishing step of a polishing process for each of the regions, wherein the polishing process comprises a plurality of polishing steps, (b) polishing a wafer using a first polishing recipe based upon an incoming wafer thickness profile, (c) determining a wafer thickness profile for the post-polished wafer of step (b), and (d) calculating an updated polishing recipe based upon the wafer thickness profile of step (c) and the model of step (a) to maintain a target wafer thickness profile. The model can information about the tool state to improve the model quality. The method can be used to provide feedback to a plurality of platen stations.

Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles

A semiconductor assembly is described in which a support element is constructed on a surface of a semiconductor lamina. Following formation of the thin lamina, which may have a thickness about 50 microns or less, the support element is formed, for example by plating, or by application of a precursor and curing in situ, resulting in a support element which may be, for example, metal, ceramic, polymer, etc. This is in contrast to pre-formed support element which is affixed to the lamina following its formation, or to a donor wafer from which the lamina is subsequently cleaved. Fabricating the support element in situ may avoid the use of adhesives to attach the lamina to a permanent support element. In some embodiments, this process flow allows the lamina to be annealed at high temperature, then to have an amorphous silicon layer formed on each face of the lamina following that anneal.

Method to form a device by constructing a support element on a thin semiconductor lamina

Retaining rings with curved surfaces are described. The curved surfaces prevent damage to a fixed abrasive polishing pad when the retaining ring is used in a polishing process. The curved surfaces are on the bottom surface of the ring, such as along the outer diameter and/or along the sidewalls of channels formed in the bottom of the ring.

Retaining ring with shaped profile

A novel method is described to create low-relief texture at a light-facing surface or a back surface of a photovoltaic cell. The peak-to-valley height and average peak-to-peak distance of the textured surface is less than about 1 microns, for example less than about 0.8 micron, for example about 0.5 microns or less. In a completed photovoltaic device, average reflectance for light having wavelength between 375 and 1010 nm at a light-facing surface with this texture is 6 percent or less, for example about 5 percent or less, in some instances about 3.5 percent. This texture is produced by forming an optional oxide layer at the surface, lightly buffing the surface, and etching with a crystallographically selective etch. Excellent texture may be produced by etching for as little as twelve minutes or less. Very little silicon, for example about 0.3 mg/cmor less, is lost at the textured surface during this etch.

Creation of low-relief texture for a photovoltaic cell

The present invention generally relates to an edge deletion module positioned within an automated solar cell fabrication line. The edge deletion module may include a grinding wheel device for removing material from edge regions of a solar cell device and cleaning the edge regions of the solar cell device after removing the material. The edge deletion module may also include an abrasive element, a portion of which is ground as it is periodically, laterally advanced toward the grinding wheel device. A controller is provided for controlling the operation and function of various facets of the module.

Solar panel edge deletion module

A semiconductor assembly is described in which a support element is constructed on a surface of a semiconductor lamina. Following formation of the thin lamina, which may have a thickness about 50 microns or less, the support element is formed, for example by plating, or by application of a precursor and curing in situ, resulting in a support element which may be, for example, metal, ceramic, polymer, etc. This is in contrast to a rigid or semi-rigid pre-formed support element which is affixed to the lamina following its formation, or to a donor wafer from which the lamina is subsequently cleaved. Fabricating the support element in situ may avoid the use of adhesives to attach the lamina to a permanent support element; such adhesives may be unable to tolerate processing temperatures and conditions required to complete the device. In some embodiments, this process flow allows the lamina to be annealed at high temperature, then to have an amorphous silicon layer formed on each face of the lamina following that anneal. A device may be formed which comprises the lamina, such as a photovoltaic cell.

Method to form a device including an annealed lamina and having amorphous silicon on opposing faces

Feedback control of chemical mechanical polishing device providing manipulation of removal rate profiles

Embodiments of the present invention provide a method of forming an electrical connection on a device. In one embodiment, the electrical connection is attached to the device via an adhesive having electrically conductive particles disposed therein. In one embodiment, the adhesive is cured while applying pressure such that the conductive particles align, have a reduced particle-to-particle spacing, or come into contact with each other to provide a more directly conductive (less resistive) path between the electrical connection and the device. In one embodiment of the present invention, a method for forming an electrical lead on a partially formed solar cell during formation of the solar cell device is provided. The method comprises placing a side-buss wire onto a pattern of electrically conductive adhesive disposed on a back contact layer of a solar cell device substrate, laminating the side-buss wire and electrically conductive adhesive between the solar cell device substrate and a back glass substrate to form a composite solar cell structure, and curing the electrically conductive adhesive while applying pressure and heat to the composite solar cell structure.

Method for forming an electrical connection

A polishing article includes a polishing layer having a polishing surface and a solid light-transmissive window in the polishing layer, the window having a first non-linear edge that extends along a first axis parallel to the polishing surface, the first non-linear edge including a plurality of projections and a plurality of recesses extending parallel to the polishing surface and disposed in an alternating pattern along the first axis.

Polishing article with integrated window stripe

A polishing apparatus is described. The polishing apparatus includes a rotatable platen, a drive mechanism to incrementally advance a polishing sheet having a polishing surface in a linear direction across the platen, a subpad on the platen to support the polishing sheet, the subpad having a groove formed therein, and a vacuum source connected to the groove of the subpad and configured to apply a vacuum sufficient to pull portions of the polishing sheet into the groove of the subpad to induce a groove in the polishing surface.

Polishing apparatus with grooved subpad

A method is described. The method includes contacting a non-solid material to a non-linear edge of a sheet of polishing material, and causing the non-solid material to solidify to form a window that contacts the non-linear edge of the polishing material.

Growing community of inventors

Sunnyvale, CA, United States of America

Gopalakrishna B Prabhu