Leybold Aktiengesellschaft

Gonde Dittmer

Dan M Goebel

Klaus Hartig

Jorg Kieser

Hans Aichert

Anton Dietrich

Robert W Conn

Gregor A Campbell

Rainer Ludwig

Rolf Adam

Michael Sellschopp

Hans Betz

Max Mayr

Friedrich Hass

Alfred Thelen

Hans G Lotz

An apparatus to apply materials to a substrate disposed in a vacuum chamber is disclosed. A separate generator chamber containing an electron emitter is connected to the vacuum chamber by a process chamber so that a plasma of controllable cross-sectional shape and large area is formed and guided by magnets toward a target system. Positive ions may be accelerated against the target by applying an adjustable negative voltage.

Method and apparatus for the application of materials

A microwave apparatus injects microwave energy into a receptacle that is at least partially transparent to microwave energy. The receptacle has a window of microwave transparent material. The apparatus includes at least one microwave transmitter and one open microwave guide which is connected to the microwave transmitter and which is situated in the immediate vicinity of the receptacle. The open microwave guide has a plurality of parallel rungs and forming a slow - wave structure of the strapped bar type. The microwave guide is of a symmetrical V-shape, and at the apex of the V it is at a smaller distance from the window than at its feed point. A microwave feeder is disposed at at least both ends of the open microwave guide.

Apparatus for injecting microwave energy by means of an open microwave

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Burscheid, Germany

Gonde Dittmer