Sony Corporation

Sony Group Corporation

Goh Matsunobu

Yoshio Inagaki

Akio Furukawa

Takashi Yamaguchi

Nobuhiko Umezu

Koichi Tsukihara

Shin Hotta

Koichiro Kishima

Koichi Tatsuki

Katsuya Shirai

Takamichi Yamakoshi

Ryu Narusawa

According to some aspects, a medical imaging system is provided. The medical imaging system includes an illumination device and a medical imaging device. The illumination device includes a first light source configured to emit first light having a wavelength range. The illumination device further includes a second light source configured to emit second light having at least one predetermined wavelength band. The at least one predetermined wavelength band is within the wavelength range. The illumination device further includes a dichroic mirror configured to attenuate a portion of the wavelength range corresponding to the at least one predetermined wavelength band and to multiplex the second light with the first light such that the portion of the wavelength range of the first light is attenuated. The light multiplexed by the dichroic mirror is emitted from the illumination device along an optical axis and irradiates an observation site. The medical imaging device includes at least one sensor configured to receive light from the observation site.

Medical imaging system, illumination device, and method

An illumination apparatus includes an optical apparatus configured to optically process laser light to produce illumination light such that speckle noise in the illumination light is reduced. The optical apparatus includes at least one collimator () configured to collimate the laser light and a diffuser () configured to diffuse the laser light.

Illumination apparatus, method and medical imaging system

A digital microscope apparatus includes: an observation image capturing unit configured to capture an observation image of each of a plurality of small areas, an area containing a sample on a glass slide being partitioned by the plurality of small areas; and a controller configured to set at least one evaluation area for the observation image of each of the plurality of small areas, the observation image being captured by the observation image capturing unit, to perform an edge detection on the at least one evaluation area, and to calculate, using results of the edge detection on two evaluation areas that are closest between two of the observation images adjacently located in a connected image, a difference in blur evaluation amount between the two observation images, the connected image being obtained by connecting the observation images according to the partition.

Digital microscope apparatus for reimaging blurry portion based on edge detection

Provided is a microscope including: dark field illumination and bright field illumination which illuminate a preparat where a sample mounted on a slide glass is covered with a cover glass and a mounting agent; an image capturing unit which acquires a dark field image by image-capturing the preparat illuminated by the dark field illumination and which acquires a bright field image by image-capturing the preparat illuminated by the bright field illumination; and a magnified portion image acquisition area determination unit which detects an edge of the cover glass in the preparat based on the dark field image and the bright field image acquired by the image capturing unit and determines an internal area of the detected edge of the cover glass as a magnified portion image acquisition area of the sample.

Microscope and area determination method

A method for detecting the specimen region includes the first step for the first region detecting unit to detect the first region which is a region with contrast in the first image of an object for observation which is photographed under illumination with visible light, the second step for the second region detecting unit to detect the second region which is a region with contrast in the second image of the object for observation which is photographed under illumination with ultraviolet light, and the third step for the specimen region defining unit to define, based on the first and second regions mentioned above, the specimen region where there exists the specimen in the object for observation.

Method for detection of specimen region, apparatus for detection of specimen region, and program for detection of specimen region

A method for crystallizing a thin film A gate insulating film formed on a substrate so as to cover a gate electrode. A light absorption layer is formed thereon through a buffer layer. Energy lines Lh are applied to the light absorption layer from a continuous-wave laser such as a semiconductor laser. This anneals only a surface side of the light absorption layer Lh and produces a crystalline silicon film obtained by crystallizing the amorphous silicon film using heat generated by thermal conversion of the energy lines Lh at the light absorption layer and heat of the annealing reaction.

Method for crystallizing thin film, method for manufacturing thin film semiconductor device, method for manufacturing electronic apparatus, and method for manufacturing display device

A gate insulating film () is formed on a substrate () so as to cover a gate electrode (), and an amorphous silicon film (semiconductor thin film) () is further formed. A light absorption layer () is formed thereon through a buffer layer (). Energy lines Lh are applied to the light absorption layer () from a continuous-wave laser such as a semiconductor laser. This oxidizes only a surface side of the light absorption layer Lh and produces a beautiful crystalline silicon film () obtained by crystallizing the amorphous silicon film () using heat generated by thermal conversion of the energy lines Lh at the light absorption layer () and heat of the oxidation reaction. This provides a method for crystallizing a thin film with good controllability at low costs achieved with simpler process.

A method of manufacturing a semiconductor device includes the steps of: modifying a semiconductor film by applying a laser beam; and forming a semiconductor device on the modified semiconductor film. In the step of modifying the semiconductor film, the laser beam and the substrate are moved relative to each other in a first direction and a second direction which is opposite to the first direction, a change in an optical characteristic between an area irradiated with the laser beam and an area which is not irradiated with the laser beam in the substrate or an optical characteristic of the irradiated area is measured in each of the first and second directions, and irradiation power of the laser beam is modulated so that the difference between a measurement result in the first direction and a measurement result in the second direction lies in a predetermined range.

Method of manufacturing semiconductor device, method of manufacturing display apparatus, apparatus of manufacturing semiconductor device, and display apparatus

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Kanagawa, Japan

Goh Matsunobu