Von Ardenne Asset Gmbh &co. Kg

Von Ardenne Anlagentechnik Gmbh

Von Ardenne Gmbh

Goetz Grosser

Thorsten Sander

Klaus Schneider

Hans-Juergen Heinrich

Steffen Mosshammer

Ralf Hauswald

Falk Milde

Goetz Teschner

Ulf Seyfert

Sven Haehne

Enno Mirring

Frank Meissner

Disclosed herein are devices, methods, and systems related to a magnetron-target coupling that includes a target coupling flange, a shaft fixedly coupled to the target coupling flange on a face opposite the target coupling flange, and having a first linear bearing component on a face opposite the target coupling flange. The magnetron-target coupling also includes a communication interface having a first communication electrode and a second communication electrode that are electrically coupled to each other wherein the second communication electrode is fixedly attached to the target coupling flange on a side opposite the shaft, the target coupling flange being disposed between the first communication electrode and the second communication electrode. The first communication electrode is supported such that it may be moved toward and/or away from the second communication electrode.

Magnetron target coupling and support device

Disclosed herein are systems, methods, devices for a magnet system that includes a housing with a housing interior. The magnet system also includes a magnet holder disposed in the housing interior and supported by the housing, preferably stationary with respect thereto. The magnet system also includes a housing cover forming a fluid-tight chamber when mated with the housing, wherein the housing cover includes a gear stage, a generator, and a rotary coupling that couples the gear stage to the generator.

Magnet system, sputtering device and housing cover

Disclosed herein are systems, methods, and devices related to a magnet system for a sputtering device. The magnet system includes a bearing frame and a magnet holder having a first mounting area and a second mounting area. The magnet system has a first support device mounted to the magnet holder by the first mounting area and a second support device mounted to the magnet holder by the second mounting area. At least one of the first mounting area and the second mounting area are configured such that a position in which the first support device and the second support device are mounted to the magnet holder relative to each other may be adjusted. The first support device and the second support device are configured to engage with the bearing frame to form a bearing device for supporting the magnet holder.

Magnet system and sputtering device

Disclosed herein are systems, devices, and methods for a magnet system for a sputtering device. The disclosed magnet system may include a housing having a housing interior. The magnet system may also include a magnet holder disposed in the housing interior and supported by the housing in a preferably stationary manner. The magnet system may also include a dehumidifying device adjacent to or disposed in the housing interior for drying the housing interior.

Magnet system, sputtering device and method

A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.

Redundant anode sputtering method and assembly

A drive end block for a rotatable magnetron comprises a housing, which has a vacuum-tight rotary feedthrough extending through a wall of the housing, and a drive apparatus for generating a torque. An output end of the rotary feedthrough lies outside the housing for connection to the rotatable magnetron and a drive end of the rotary feedthrough lies inside the housing for introducing a torque. The drive apparatus is situated outside the housing of the drive end block and is connected using a torque transmission apparatus to the drive end of the rotary feedthrough so that the drive apparatus is electrically insulated from the housing and the rotary feedthrough of the drive end block.

Drive end-block for a rotatable magnetron

An end block for a magnetron device having a rotatable target comprises an end block housing having a pivot bearing. The end block housing is adapted on its outer side for attachment on a support unit, and the pivot bearing is adapted on an end that is accessible from outside the end block housing, for connection to the rotatable target. The end block housing is movably attached on the support unit. A vacuum coating apparatus has a vacuum chamber, a magnetron device situated in the vacuum chamber, and a rotatable target rotatably mounted on at least one such end block.

Growing community of inventors

Dresden, Germany

Goetz Grosser