Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

University of Virginia Patent Foundation

Goesta Mattausch

Haydn N G Wadley

Volker Kirchhoff

Henry Morgner

Siegfried Schiller

Derek Hass

Olaf Roeder

James F Groves

Rainer Bartel

Frank-Holm Roegner

Henrik Flaske

Haydn N Wadley

Peter Feinaeugle

Dieter Weiske

Rainer Zeibe

Joerg Kubusch

A plasma generation process that is more optimized for vapor deposition processes in general, and particularly for directed vapor deposition processing. The features of such an approach enables a robust and reliable coaxial plasma capability in which the plasma jet is coaxial with the vapor plume, rather than the orthogonal configuration creating the previous disadvantages. In this way, the previous deformation of the vapor gas jet by the work gas stream of the hollow cathode pipe can be avoided and the carrier gas consumption needed for shaping the vapor plume can be significantly decreased.

Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof

Device for producing an electron beam includes a housing, which delimits a space that is evacuatable and has an electron beam outlet opening; an inlet structured and arranged for feeding process gas into the space; and a planar cathode and an anode, which are arranged in the space, and between which, a glow discharge plasma is producible by an applied electrical voltage. Ions are accelerateable from the glow discharge plasma onto a surface of the cathode and electrons emitted by the cathode are accelerateable into the glow discharge plasma. The cathode includes a first part made of a first material at least on an emission side, which forms a centrally arranged first surface region of the cathode, and a second part made of a second material, which forms a second surface region of the cathode that encloses the first surface region.

Device for producing an electron beam

The invention relates to a device and a method for altering the characteristics of a three-dimensional article by means of electrons, including at least one electron accelerator for generating accelerated electrons and two electron exit windows, wherein the two electron exit windows are arranged opposite one another, wherein the two electron exit windows and at least one reflector delimit a process chamber in which the surface or surface layer of the article are bombarded with electrons, wherein an energy density distribution inside the process chamber can be detected at least over one spatial dimension by means of a sensor system.

Device and method for altering the characteristics of three-dimensional shaped parts using electrons and use of said method

Plasma deposition apparatus () and method that allows metal or nonmetal vapor () to be generated by electron-beam evaporation, guides that vapor using a noble gas stream (containing reactive gases in cases of reactive evaporation), ionizes the dense directed gas and vapor stream at working pressures above about 0.0001 mbar using a hollow cathode plasma arc discharge (), and conveys the ionized vapor and/or gas stream towards the substrate () for impact on the surface at energies varying from thermal levels (as low as about 0.05 eV) up to about 300 eV.

Process and apparatus for plasma activated depositions in a vacuum

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Ullersdorf, Germany

Goesta Mattausch