Ciba-geigy Corporation

Godwin Berner

Rudolf Kirchmayr

Jean Rody

Manfred Rembold

Werner Rutsch

Rinaldo Husler

Mario Slongo

Franciszek Sitek

Andreas Valet

Kurt Dietliker

Kurt Meier

Friedrich Karrer

Max Hunziker

Christopher G Demmer

James Jack

Aloysius H Manser

Ljubomir Misev

William Hoyle

Louis Felder-Schraner, Deceased

Aloysius H Manse

Liquid highly active photoinitiators are obtained by dissolving a solid photoinitiator of the titanocene type in liquid photoinitiators of the acetal or ketal type. The liquid mixtures have a long dark storage stability.

Liquid photoinitiator mixtures

Light-stabilized polymer microparticles, which contain at least one light stabilizer, and processes for the preparation of these microparticles by polymerization of suitable monomers, at least a part of the polymerization being carried out in the presence of at least one light stabilizer, are described. The polymer microparticles can be used in coating compositions which comprise a disperse phase containing these particles and a liquid continuous phase. Coatings and finishes based on the compositions according to the invention are distinguished by improved weathering resistance, in particular by a high light stability.

Light-stabilized polymer microparticles

A carrier film is coated on one side with a radiation curable paint and on the other with an adhesive. The paint is partially cured by irradiation, the carrier film is heated and, in the thermoplastic state, applied by deep drawing to a three-dimensional substrate. In a final step the paint is completely cured by heat.

Application of a painted carrier film to a three-dimensional substrate

o-Hydroxyphenyl-s-triazines of formula I ##STR1## wherein n is 1 or 2 and R.sub.1 to R.sub.7 are as defined in claim 7, are good light stabilizers for coating compositions which contain a basic curing catalyst. In contradistinction to other UV absorbers, they do not cause discolorations in the presence of such catalysts.

Coating compositions stabilized against light, heat and oxygen

A compound of formula ##STR1## wherein R.sub.0, R.sub.1, R.sub.2, R.sub.3, R.sub.6 and X are as defined in claim 1, are suitable for use as UV absorbers for protecting light-sensitive organic materials.

UV absorbers and light-sensitive organic material containing same

Compounds of the formula ##STR1## wherein R.sub.o, is hydrogen or alkylene-COOR where R is alkyl or hydroxyalkyl, R.sub.1 is hydrogen, alkyl, hydroxyalkyl, alkenyl or acyl, R.sub.2 and R.sub.3 are independently hydrogen, alkyl, alkenyl or alkoxy, R.sub.6 is hydrogen or alkyl, and X is --CH.sub.2 --, --NH--, --S-- or --O--, are suitable as UV absorbers for use in photosensitive organic materials in combination with a sterically hindered amine or hydroxyphenylbenzotriazole derivative.

Photosensitive organic polymeric material containing UV absorbers

The photopolymerizable composition described contains

Photopolymerizable compositions containing aminoaryl ketone

Compounds of the formula ##STR1## in which a is 1, 2, or 3, R.sup.1 is an uncharged, carbocyclic or heterocyclic aromatic ring, unsubstituted or substituted, R.sup.2 is an unsubstituted or substituted cyclopentadienyl or indenyl anion, and .vertline.X.vertline..sup.a- is an a-valent anion, are suitable for use as latent curing catalysts for two-component polyurethane coatings which are activated by irradiation with actinic light or by heating.

Process for curing polyurethane coatings and compositions

The photopolymerizable mixture described contains

Aminoaryl ketone photoinitiators

Sterically hindered cyclic amines which are substituted by a photoactivatable acyl group at the basic nitrogen atom can be deacylated by irradiation with UV light. This is advantageous if the basicity of the amines proves troublesome during application. Examples of such photoactivatable acyl groups are phenylglyoxyl, phenylacetyl or naphthylacetyl groups.

Photolytically cleavable N-acylated sterically hindered amines

Coatings of polyisocyanates, which contain a latent catalyst of the formula I

Process for curing polyisocyanate coatings in the presence of a

Photolytically cleavable, N-acylated sterically hindered amines

Oxime sulfonates of formula I ##STR1## wherein Y is a polymerizable unsaturated group or epoxide group or an --OH, --NHR.sup.5, --COOH, COOR.sup.6, --COCl, --CH.sub.2 Hal, --SO.sub.2 Cl or --NCO group, Z is an (x+y)-valent connecting member, R.sup.1 and R.sup.2 are monovalent organic radicals, m is 0 or 1, x is 1 or 2 and y is 1 or 2, can be converted into polymers which can be thermally or photochemically dissociated to form free sulfonic acid groups. Said polymers can therefore be used as photoresists which can be developed with aqueous alkalis.

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Binningen, Switzerland

Godwin Berner