Canon Kabushiki Kaisha

Go Tsuchiya

Masato Muraki

Kentaro Sano

A drawing apparatus includes: a plurality of charged particle optical systems arranged along a first direction; a storage configured to store drawing data shared by the plurality of charged particle optical systems with respect to each of sub-drawing regions obtained by dividing a drawing region on the substrate of each of the plurality of charged particle optical systems in the first direction; and a controller configured to determine a drawing region on the substrate by each of the plurality of charged particle optical systems as a set of the sub-drawing regions, and control each of the plurality of charged particle optical systems based on a corresponding set of the sub-drawing regions.

Drawing apparatus, and method of manufacturing article by controlling a plurality of charged particle optical systems based on respective sets of sub-drawing regions

The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams, a deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, of a charged particle source for radiating a charged particle beam and which deflect the respective charged particle beams, and to individually change irradiated positions of the respective charged particle beams on the aperture array by driving the respective first deflectors, and a controller configured to control deflection of the charged particle beams by the first deflectors to reduce a dispersion of intensities of the respective charged particle beams on the substrate.

Drawing apparatus and method of manufacturing article

An exposure apparatus which exposes a substrate to pulsed light supplied from a light source, includes an input device, and a controller configured to periodically change a wavelength of the pulsed light emitted by the light source, wherein the controller is configured to calculate number of pulsed light required to expose each point on the substrate based on a parameter input from the input device, and configured to determine a changing period of the wavelength based on the calculated number.

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Tochigi, Japan

Go Tsuchiya