Toshiba Memory Corporation

Kabushiki Kaisha Toshiba

Kioxia Corporation

Micron Technology Incorporated

Go Shikata

Takuya Futatsuyama

Hiroshi Maejima

Hideaki Aochi

Takashi Maeda

Yasuhiro Shimura

Katsuaki Isobe

Keisuke Nakatsuka

Tomoya Sanuki

Susumu Fujimura

Naohito Morozumi

Shigekazu Yamada

Koki Ueno

Toshiaki Edahiro

Takahiko Sasaki

Tomonori Kurosawa

Fumiharu Nakajima

Rieko Funatsuki

Noboru Ooike

Some embodiments include apparatuses and methods of operating the apparatuses. One of the apparatuses includes a first memory block including first word lines for respective first memory cells of the first memory block; a second memory block including second word lines for respective second memory cells of the second memory block; first diffusion regions coupled to the first word lines; second diffusion regions adjacent the first diffusion regions, the second diffusion regions coupled to the second word lines; and a circuit to apply a voltage to the second diffusion regions in a write operation performed on the first memory block.

Memory device including voltage control for diffusion regions associated with memory blocks

A data latch circuit includes a first n-channel transistor and a first p-channel transistor. A gate of the first n-channel transistor and a gate of the first p-channel transistor are a common gate.

Data latch circuit and semiconductor memory device

According to one embodiment, a semiconductor memory includes: a first bit line; a first select transistor having a first terminal connected to the first bit line; a first memory cell connected to a second terminal of the first select transistor; a circuit connected to the first bit line and applying an erase voltage to be applied to the first memory cell to the bit line via the first terminal and the second terminal; and a diode connected to the first bit line and the first circuit.

Semiconductor memory

A semiconductor memory device includes wirings arranged in parallel along a first direction, the wirings including first and second wirings that are adjacent and a third wiring adjacent to the second wiring, a first pillar between the first and second wirings and a second pillar between the second and third wirings, the first and second pillars each extending in a second direction crossing the first direction toward the semiconductor substrate, and first and second bit lines connected to the first and second pillars, respectively. A first voltage is applied to the second wiring during a program operation on a first memory cell at an intersection of the second wiring and the first pillar, and a second voltage higher than the first voltage is applied to the second wiring during a program operation on a second memory cell at an intersection of the second wiring and the second pillar.

Semiconductor memory device

A semiconductor memory device includes first and second memory transistors and first and second word lines connected to gate electrodes of the memory transistors. The semiconductor memory device is configured such that a first write operation to the first memory transistor, a second write operation to the second memory transistor, a third write operation to the first memory transistor, and a fourth write operation to the second memory transistor are executed in this order. In the first and second write operations, data write is performed using only a program operation. In the third and fourth write operations, data write is performed using the program operation and the verify operation.

A semiconductor memory device includes a first memory cell transistor, a second memory cell transistor, and a third memory cell transistor that are connected in series. A word line is coupled to a gate of the third memory cell transistor. A controller is configured to set a first upper limit value for voltages applied to the word line during writing of data to the first memory cell transistor and a second upper limit value for voltages applied to the word line during writing of data to the second memory cell transistor. The second upper limit value is different from the first upper limit value.

Semiconductor memory device in which different upper limit values are set for pass voltages

According to one embodiment, a semiconductor memory device includes first and second memory cells, a word line, first and second bit lines, a sense amplifier and a driver. The first and second memory cells have first and second threshold voltages, respectively. The word line is electrically connected to the first and second memory cells. The first and second bit lines are electrically connected to the first and second memory cells, respectively. The driver increases gradually the voltage of the word line. When the voltage of the word line is increased gradually by the driver, the sense amplifier senses the first and second threshold voltages in ascending order.

Semiconductor memory device configured to sense memory cell threshold voltages in ascending order

A semiconductor memory device includes a plurality of memory cells, a plurality of word lines, including a word line that is connected to a group of the memory cells, and a control circuit configured to execute a write operation on the memory cells of the group. The write operation includes multiple program loops including a first program loop and a second program loop that is executed at a later time than the first program loop, and for each subsequent program loop, a program voltage that is applied to the first word line is increased from that of a current program loop. The program voltage is increased by a first amount from that of the current program loop if the next program loop is the first program loop and by a second amount that is less than the first amount if the next program loop is the second program loop.

Semiconductor memory device and memory system

According to one embodiment, a semiconductor memory device includes the following structure. A memory cell array includes memory cells arranged at positions where bit lines and word lines cross are arranged on a semiconductor substrate. A sense amplifier reads data stored in the memory cell. The hookup region includes a transfer transistor arranged between the memory cell array and the sense amplifier. One end of a current path of the transfer transistor is connected to a first interconnect formed between the semiconductor substrate and the bit line. The other end of the current path is connected to the sense amplifier. A guard ring region is arranged between the memory cell array and the hookup region. A contact plug is arranged to overlap the guard ring region.

According to one embodiment, a semiconductor device having a pattern layout includes a first interconnect pattern and a contact pad. The first interconnect pattern includes lines and spaces which are alternately aligned in a first direction with a predetermined pitch. The contact pad is arranged between the lines in the first interconnect pattern and has a width that is triple the predetermined pitch. An interval between the line in the first interconnect pattern and the contact pad is the predetermined pitch, and the predetermined pitch is 100 nm or below.

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Yokohama Kanagawa, Japan

Go Shikata