Mitsubishi Materials Corporation

Mitsubishi Materials Silicon Corporation

Mitsubishi Materials Polycrystalline Silicon Corporation

Go Sasaki

Nobuyuki Soyama

Katsumi Ogi

Tadashi Yonezawa

Tsutomu Atsuki

Kenji Hori

Takanori Ito

When packing a polycrystalline silicon with a two-layer structured packing body comprising an inner bag () and an outer bag (), there are used the inner bag () and the outer bag () having bottom sections () provided with a pair of tucked sections, the shape of which is substantially a triangle in plan view, formed by inward-folding the portions continued from both of rectangular side face sections (), and when storing the inner bag () that stores the polycrystalline silicon therein into the outer bag (), the bottom sections () are superimposed with the respective tucked sections () of the inner bag () and the outer bag () displaced from each other by 90&#xb0; so that they do not overlap on each other.

Method of packing silicon and packing body

The storage container for a liquid chlorosilane of the present invention comprises, a tank which stores the liquid chlorosilane, a valve which is connected to the tank and to which an external pipe can be connected detachably, and a closing lid which seals the valve when the external pipe is detached from the valve. The valve comprises a housing and a valve body provided in the housing. The closing lid has a lid body having a sealing surface contacting the connecting surface of the connecting flange, a supply pipe which supplies an inert gas to a space between the closing lid and the valve body in the housing, a supply valve which opens or closes the supply pipe, a discharge pipe which discharges a gas in the space, and a discharge valve which opens or closes the discharge pipe.

Storage container for liquid chlorosilane and closing lid therefor

An evaluation method for polycrystalline silicon including the steps of immersing the polycrystalline silicon in an agent which is capable of dissolving the polycrystalline silicon, and counting the number of foreign particles in the agent. The polycrystalline silicon thus evaluated may be used as a material for pulling single crystal silicon. The evaluation method may further include a step of analyzing the composition of the foreign particles. In yet another aspect, the evaluation method may further include a step of subjecting the agent to a circulation filtering process prior to the immersion of the polycrystalline silicon in the agent.

Evaluation method for polycrystalline silicon

A composition for forming a metal oxide thin film pattern which is a solution containing one or more hydrolytic metal compounds selected from the group consisting of hydrolytic organometallic compounds (e.g., metal alkoxide) and metal halides, and a water generating agent which frees water under the effect of irradiation with active rays (e.g., o-nitrobenzyl alcohol and 2-nitroethanol) and, as required, an acid generating agent which frees acid under the effect of irradiation with active rays is disclosed. A thin film pattern is formed by coating the composition onto a substrate, irradiating active rays for forming an image on the resultant photosensitive coating film, developing the same with water or an alcoholic solvent to remove the non-exposed portion, and heat-treating the substrate to convert the remaining film into a metal oxide, thereby forming a negative-type metal oxide thin film pattern.

Growing community of inventors

Yokkaichi, Japan

Go Sasaki