Mitsubishi Rayon Company, Limited

Mitsubishi Chemical Corporation

Go Otani

Yusuke Nakai

Seiichiro Mori

Eiko Okamoto

Tsuyoshi Takihara

Junichi Nakamura

Yoshiko Irie

Tetsuya Jigami

Taeko Oonuma

Masashi Ikawa

Satoru Ozawa

Kazuyoshi Odaka

Kousuke Fujiyama

Eri Masuda

Shinji Makino

Sora Tomita

Keiko Yasukawa

There is provided an epoxy resin composition comprising a (meth)acrylic copolymer (A), an epoxy resin (B), and a curing agent (C), wherein the (meth)acrylic copolymer (A) has a constituent unit derived from a macromonomer (a) and a constituent unit derived from a vinyl monomer (b), and wherein a glass transition temperature (TgB) of a polymer obtained by polymerizing only the vinyl monomer (b) is 25° C. or less.

Macromonomer copolymer, epoxy resin composition, adhesive, molding material, and cured product

Provided is a macromonomer copolymer (Y) including a monomer unit of a specific macromonomer (A) and a monomer unit of a comonomer (B) copolymerizable with the macromonomer (A), in which a value of Hx represented by a specific expression is 0.05 to 0.40.

Macromonomer copolymer and method for producing same

A structure with a substrate, and a fine-unevenness-structure layer provided to at least one surface of the substrate, wherein the fine-unevenness-structure layer is disposed at a surface of the structure, the indentation elastic modulus of the structure is 1-1300 MPa, and the ratio (&#x394;&#x3bc;) of the rate of change of the coefficient of kinetic friction of the surface of the structure is 0.15-1.05, wherein &#x394;&#x3bc;=&#x394;&#x3bc;f/&#x394;&#x3bc;s: &#x394;&#x3bc;s represents the rate of change of the coefficient of kinetic friction of the surface of the structure at an initial-abrasion stage of a reciprocating abrasion test; and &#x394;&#x3bc;f represents the rate of change of the coefficient of kinetic friction of the surface of the structure immediately prior to the end of the reciprocating abrasion test. This structure exhibits excellent scratch resistance without compromising on the optical performance thereof, such as the antireflection performance.

Structure, production method thereof, and article provided with said structure

Provided is an article having high scratch resistance and satisfactory fingerprint wipeability. Disclosed is an article having a microrelief structure containing a cured product of a resin composition on the surface, in which the indentation elastic modulus (X) [MPa] and the creep deformation ratio (Y) [%] of the cured product satisfy the following formulas (1) and (2):80&#x2266;&#x2266;560&#x2003;&#x2003;(1)&#x2266;(0.00022&#x2212;0.01)&#xd7;100&#x2003;&#x2003;(2).

Article and active energy ray-curable resin composition

The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.

Active energy ray-curable resin composition, product having the uneven microstructure, and method for producing product having the uneven microstructure

A method for preparing an article having an uneven microstructure on a surface thereof, including coating a surface of a mold having an uneven microstructure formed from an anodized alumina oxide on a surface with a release treatment solution including a mold release agent that includes one or more kinds of phosphoric ester compound and the pH of the aqueous solution when extracted with 50 mL of water with respect to 1 g of the mold release agent is 3.0 or more; and interposing an active energy ray curable resin composition including a polymerizable compound, a polymerization initiator, and an internal release agent between the mold and the substrate, and curing the active energy ray curable resin composition by the irradiation with active energy rays to form a cured resin layer having the uneven microstructure transferred on a surface of the substrate.

Method for preparing article having uneven microstructure on surface thereof

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Otake, Japan

Go Otani