Rigaku Corporation

Go Fujinawa

Hitoshi Okanda

Ryuji Matsuo

Akira Echizenya

Kazuhiko Omote

Tetsuya Ozawa

Katsuhiko Shimizu

Akihiro Himeda

Shiro Umegaki

Atsushi Ohbuchi

Takayuki Konya

An analysis apparatus, an analysis method, and an analysis program by which even unskilled ones can perform quantitative analysis of a composition of high-performance cement with high precision. An analysis apparatusfor performing quantitative analysis of components of cement, includes: a content percentage conversion unitfor converting content percentages of major elements of a cement sample to content ratios of main crystal phases composing the cement sample by predetermined formulae, the content percentages being obtained as an elemental analysis result; a scale factor estimation unitfor estimating initial values of scale factors of Rietveld analysis from the content ratios of main crystal phases obtained in the conversion; and a Rietveld analysis unitfor performing Rietveld analysis with respect to an X-ray diffraction measurement result of the cement sample using the initial values of scale factors previously been estimated to calculate content percentages of respective phases of the cement sample.

Analysis apparatus, analysis method and analysis program

An X-ray diffraction measuring apparatus equipped with Debye-Scherrer optical system therein, comprises a generator for generating a characteristic X-ray to be irradiated upon a sample to be measured; an X-ray detector being disposed to surround that sample around; and a focusing arrangement, being disposed between the sample and the X-ray detector, for collecting an X-ray scattering from the sample covering over a predetermined angle, in a peripheral direction, around the sample, and for focusing and irradiating it upon the X-ray detector.

X-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an X-ray diffraction measuring method for the same

An X-ray optical system provides selectively a linear X-ray beam and a point X-ray beam while using an X-ray source which generates an X-ray beam having a linear section. When the point X-ray beam is selected, an X-ray intensity per unit area becomes higher. The X-ray optical system has an X-ray source, a parabolic multilayer mirror to which an aperture slit plate is attached, an optical-path selection slit device, a polycapillary optics and an exit-width restriction slit. The polycapillary optics and the exit-width restriction slit are detachably inserted into a path of a parallel beam coming from the parabolic multilayer mirror, and thus they can be removed from the path and a Soller slit and a divergence slit can be inserted instead.

X-ray optical system

An X-ray optical system for small angle scattering has a parabolic multilayer mirror and, so that switching to other X-ray incident optical systems for X-ray analysis can be easily performed. A parabolic multilayer mirror, an optical-path selecting slit device, a small-angle selecting slit device and a Soller slit are arranged between an X-ray source and a specimen-side slit. An X-ray beam having passed through the first aperture of an aperture slit plate is interrupted by the optical-path selecting slit. An X-ray beam having passed through the second aperture of the aperture slit plate is reflected at the reflecting surface of the multilayer mirror to become a parallel beam. This parallel beam passes through an aperture of the optical-path selecting slit device. The beam width is restricted by a narrow slit of the small-angle selecting slit device.

X-ray optical system for small angle scattering

Parallel X-ray beams with two kinds of wavelength are made with the use of a single parabolic multilayer mirror. A single parabola prepared for a CuKa X-ray is used for making parallel X-ray beams of both the CuKa X-ray and the CoKa X-ray. The CuKa ray emitted from a first X-ray focal spot located at the focus of the parabola is reflected at a reflecting surface composed of the parabola to become a parallel beam going out. When a second X-ray focal spot is arranged at the position apart from the first X-ray focal spot by a predetermined distance, the CoKa X-ray emitted from the second X-ray focal spot is reflected at the same reflecting surface to become a parallel beam going out.

Method and apparatus for making parallel X-ray beam and X-ray diffraction apparatus

In the measurement with the focusing method, an X-ray beam from an X-ray source passes through an opening of a path-selection slit device and is narrowed by a divergence slit with a predetermined divergence angle and is thereafter incident upon a sample. The changing operation from the focusing method into the parallel beam method is carried out by turning, by 180 degrees, the path-selection slit device around its axis of rotation and by moving the divergence slit in a direction perpendicular to an X-ray traveling direction. Then, the X-ray beam from the X-ray source is reflected by a multilayer mirror to become a parallel beam and passes through the opening of the path-selection slit device and is thereafter incident upon the sample. Thus, the turning of the path-selection slit device enables the change between the focusing method and the parallel beam method, requiring no re-setting operation for the optical system.

X-ray diffraction apparatus

A soller slit includes a plurality of metal foils and a plurality of spacers. The spacers are laminated alternatively with the metal foils to support one end portions of the metal foils with a space between adjacent metal foils. The other end portions of the metal foils are opened to be unsupported as a free end. When the soller slit is used in an X-ray apparatus, other X-ray optical components, such as monochromator or a specimen to be analyzed, then the soller slit can be arranged in contact with or in the vicinity of the unsupported end portions of the soller slit. That is, it is possible to unify the soller slit and other X-ray optical components in an assembled state. Therefore, a space dedicated to the soller slit becomes unnecessary. Further, since it is possible to shorten a passage of X-rays correspondingly, attenuation of X-rays to be detected by the X-ray detector can be avoided.

Soller slit and X-ray apparatus

A soller slit is disclosed, which includes a plurality of metal foils and functions to restrict divergence of X-rays when arranged on an X-ray optical path. The metal foils are prepared by sintering a metal material such that surface thereof have high harmonic surface roughness. Alternatively, the metal foil has oxides formed by oxidation on the surfaces thereof such that the oxides can provide the high harmonic surface roughness. The high harmonic surface roughness of the metal foil restricts total reflection of X-rays at the metal foil. Therefore, it is possible to form high precision parallel X-ray beams by the soller slit to thereby improve resolution in an X-ray measurement.

Growing community of inventors

Hamura, Japan

Go Fujinawa