Arkema Inc.

Elf Atochem North America, Inc.

Atofina Chemicals, Inc.

Glenn P Florczak

Ryan R Dirkx

David A Russo

A composition for coating glass by chemical-vapor deposition comprises a mixture of a tin oxide precursor monobutyltin trichloride, a silicon dioxide precursor tetraethylorthosilicate, and an accelerant such as triethyl phosphite; the composition is gaseous below 200&#xb0; C., and permits coating glass having a temperature from 450&#xb0; to 650&#xb0; C. at deposition rates higher than 350 &#x212b;/sec. The layer of material deposited can be combined with other layers to produce an article with specific properties such as controlled emissivity, refractive index, abrasion resistance, or appearance.

Coating composition for glass

The present invention concerns the deposition of fluorine modified, titanium dioxide films (TiO,) onto hot glass by atmospheric pressure chemical vapor deposition (APCVD) using TiCl,vapor. The invention is also suitable for depositing other metallic oxide films from their metallic halides such as SnCl,, GeCl,, and VCl,. The present invention provides a process that deposits a novel, fluorine modified, titanium dioxide film (TiO,) onto hot glass by atmospheric pressure chemical vapor deposition using TiCl,vapor. The process uses injection of TiCl,into a hot, nonoxygen containing carrier gas and blends the carrier gas and TiCl,vapor with an oxygen containing gas stream containing a haze reducing quantity of a fluorine containing compound before contacting a surface of hot glass with the blended mixture. The process is capable of depositing a fluorine modified, TiO,film at deposition rates exceeding 900 &angst; per second. The crystalline phase of the fluorine modified film is essentially anatase. The film has a haze of less then 1% and a refractive index of greater than or equal to about 2.48. Also provided is an apparatus for practicing the process and a novel coated glass.

Preparation of fluorine modified, low haze, titanium dioxide films

A composition for coating glass by chemical-vapor deposition comprises a mixture of a tin oxide precursor monobutyltin trichloride, a silicon dioxide precursor tetraethylorthosilicate, and an accelerant such as triethyl phosphite; the composition is gaseous below 200.degree. C., and permits coating glass having a temperature from 450.degree. to 650.degree. C. at deposition rates higher than 350 .ANG./sec. The layer of material deposited can be combined with other layers to produce an article with specific properties such as controlled emissivity, refractive index, abrasion resistance, or appearance.

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East Brunswick, NJ, United States of America

Glenn P Florczak