University of California

Dow Global Technolgoies LLC

Rohm & Haas Electronic Materials LLC

Kraton Polymers U.S. LLC

The Dow Chemical Company

Mitsubishi Chemical Corporation

Cornell University

Polye Inc.

Glenn H Fredrickson

Edward J Kramer

Peter Trefonas, Iii

Phillip Dene Hustad

Valeriy V Ginzburg

Bongkeun Kim

Craig Jon Hawker

Peidong Yang

Galen D Stucky

Bradley F Chmelka

David J Pine

Patrick Schmidt-Winkel

Qisheng Huo

Dongyuan Zhao

Nick Melosh

Jianglin Feng

David Margolese

Wayne Lukens, Jr

Carl Lesley Willis

Dale Lee Handlin, Jr

Robert Charles Bening

Stephen F Hahn

Damien Montarnal

Peter Pasman

Geoffrey William Coates

Frank Steven Bates

Fumihiko Shimizu

Mary Ann Jones

Jerry L Hahnfeld

Hisashi Ohtaki

Nathaniel A Lynd

Cora M Leibig

Molly T Reinhardt

Zhigang Wang

Chin Chu

Kate Barteau

Raffaele Mezzenga

Disclosed herein is a pattern forming method comprising disposing upon a substrate a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that has a lower or a higher surface energy than the block copolymer; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer of the block copolymer to form a morphology of periodic domains formed from the first polymer and the second polymer; where a longitudinal axis of the periodic domains are parallel to the substrate.

Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same

Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.

Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.

Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottle brush polymer; where the bottle brush polymer comprises a homopolymer that is the chemically and structurally the same as one of the polymers in the block copolymer or where the additive polymer comprises a graft copolymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.

The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.

Compositions for controlled assembly and improved ordering of silicon-containing block copolymers

The present invention relates to a thermoplastic elastomer composition which comprises a branched olefin copolymer comprising: a main chain of an ethylene/&#x3b1;-olefin copolymer; and a side chain derived from a crystalline propylene polymer containing a vinyl group at one end, wherein the content of &#x3b1;-olefin in the main chain is 70 mol % or less, the composition has an elongation at break of 500% or higher, and has an elastic recovery rate of 70% or more when recovering from an extension to 300% elongation, and a process for manufacturing the same.

Thermoplastic elastomer composition and process for manufacturing the same

Polyolefin block and graft copolymers comprised of two or more semicrystalline polyolefin blocks or grafts and one or more amorphous polyolefin blocks can be blended with a low molecular weight fluid diluent that preferentially locates within and swells the amorphous domains of the block or graft copolymer, while preserving the crystallinity of the semicrystalline block domains. After mechanical or thermomechanical processing, such compositions combine softness with high strength and high recoverable elasticity. Compositions are also disclosed whereby the diluent species is removed from the composition, either before or after the mechanical or thermomechanical processing, in order to create a strong elastic material with an ultra-low entanglement density within the amorphous domains.

Soft and strong elastomeric compositions from semicrystalline-amorphous polyolefin block copolymers

A polymer electrolyte composition including a metal salt and at least one polymer comprising a poly(glycidyl ether), where the at least one polymer is amorphous at ambient temperature. The poly(glycidyl ether) polymer can be a blend of poly(glycidyl ether) polymers, can be a poly(glycidyl ether) polymer blended with a mechanically strong solid polymer, and can be a block of a block copolymer that also includes a polymer block forming a mechanically strong solid polymer.

Polymer electrolytes based on poly(glycidyl ether)s

The present invention provides a block copolymer composition and method of making the same having the structures (A-B)-X-(A) or (A-B)-X-(BA), where Aand Aare each a polymer block of a monoalkenyl arene and B, B, and Bare each a polymer block of one or more conjugated dienes or a hydrogenated diene polymer, n is an integer from 2 to 30 and X is the residue of a coupling agent.

Miktopolymer compositions

The present invention provides a block copolymer composition and method of making the same having the structures (A-B)&#x2014;X-(A) or (A-B)&#x2014;X&#x2014;(BA), where Aand Aare each a polymer block of a monoalkenyl arene and B, B, and Bare each a polymer block of one or more conjugated dienes or a hydrogenated diene polymer, n is an integer from 2 to 30 and X is the residue of a coupling agent.

Mesoscopically ordered, hydrothermally stable metal oxide-block copolymer composite or mesoporous materials are described herein that are formed by using amphiphilic block polymers which act as structure directing agents for the metal oxide in a self-assembling system.

Block polymer processing for mesostructured inorganic oxide materials

A 'high internal phase polymeric emulsion' ('HIPPE') composition is described which comprises an emulsion of a discrete phase (component A) and a continuous phase (component B), wherein the volume fraction of the discrete phase is the majority fraction (on a volume basis) of the total volume of the emulsion. A compatibilizer, component C, is used to lower the interfacial tension between the phases containing components A and B. A process is described for creating such HIPPE composition in which the A component is a colloidal polymer particle.

Process for creating high internal phase polymeric emulsions

Block copolymer processing for mesostructured inorganic oxide materials

A high internal phase emulsion composition comprising: a) at least three components; b) component A is a polymer, monomer or mixture thereof; c) component B is a polymer; d) component C is a compatiblizer; e) substantially no voids; and wherein the volume fraction of component A represents at least about 80% by volume of the total volume of components A, B and C; and wherein the volume fraction of component B represents less than about 20% by volume of the total volume of components A, B and C; and wherein at least two phases are formed, a phase containing a majority of component A is discrete and a phase containing a majority of component B is continuous.

High internal phase polymeric emulsion composition

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Santa Barbara, CA, United States of America

Glenn H Fredrickson