Siemens Healthcare Diagnostics Gmbh

Asml Holding N.v.

Other

Glenn Friedman

Jorge S Ivaldi

James A McClay

Michael A DeMarco

Santiago E Del Puerto

Peter Conrad Kochersperger

Joseph Laganza

Thomas Creazzo

Erich Kling

Chris Beliveau

One embodiment provides a method of automatically aligning an indexing machine with a robotic end effector including: inserting, using a robotic arm, a hunting tool into an aperture, the hunting tool comprising a pressure sensitive tip; detecting, using a plurality of sensing beams, a first location of the hunting tool within the aperture; rotating, using the robotic arm, the hunting tool 180 degrees; detecting, using the plurality of sensing beams, a second location of the hunting tool within the aperture; calculating a runout magnitude and a runout direction based on the first location, the second location, and the robotic arm; inserting, using the robotic arm, the hunting tool into a target; determining, using the pressure sensitive tip, a location of the hunting tool with respect to the target; and thereafter, adjusting the location of the hunting tool with respect to the aperture and target based on said determined location and said calculated runout magnitude and direction. Other aspects are described and claimed herein.

Automated alignment of a testing system

An articulated sample rack apparatus is disclosed. In one aspect, the articulated sample rack apparatus has a plurality of coupled rack components wherein at least some of the rack components have a receptacle having a bottom to receive a sample container, the rack having free ends and at least one hinge allowing articulation between at least some of the rack components. Conveyor systems and methods to convey sample racks are provided, as are other aspects.

Articulated sample container rack apparatus, rack conveyor systems, and methods of conveying sample containers

A method adapted to transfer a sample container such as a capped sample tube is disclosed. In one aspect, the method includes gripping a sample tube body with a first gripper pair and a cap with a second gripper pair of a gripper apparatus. In another aspect, a seating member may contact the cap to aid in the positioning of the sample container. Apparatus and systems for carrying out the method are provided, as are other aspects.

Methods, systems, and apparatus adapted to transfer sample containers

Disclosed are systems and apparatus adapted to aid in calibration of an offset position&#x2014;between a position sensor and an end effector in a processing system. The system includes a robotic component having an end effector and a position sensor coupled thereto, a teach target having a first geometrical feature, and an offset tool adapted to be engaged by the end effector, the offset tool including a first docking feature. The system further includes a moveable offset target having a second docking feature adapted to be engaged by the first docking feature and a second geometrical feature adapted to be sensed by the position sensor. The end effector moves the offset tool to the offset target and docks them. A position of the teach target and the offset target may then be sensed with the position sensor to determine an actual offset of the end effector with respect to the position sensor. Methods of operating the system are provided, as are other aspects.

Methods, systems, and apparatus for calibration of a positional offset between an end effector and a position sensor

An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having a reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.

Method for transferring and loading a reticle

A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.

System and method for reticle protection and transport

An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having an reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.

Apparatus for transferring and loading a reticle with a robotic reticle end-effector

A substrate protection and transport system and method for transitioning a substrate from atomospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes. Each cassette has at least one vent and at least one filter. The system further includes an end effector coupled to a robotic arm to enable the substrate to be positioned within one of the cassettes, thereby forming a cassette-substrate arrangement. The system further includes a box having a base and a lid. The box holds one or more of the cassette-substrate arrangements. In this way, a box-cassette-substrate arrangement is provided. An out of vacuum storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Still further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. To transport the substrate, the substrate is first loaded into a removable substrate transport cassette. Next, the cassette-substrate arrangement is loaded into the box. The box-cassette-substrate arrangement is then transported to a shelf of an out of vacuum storage rack. During further processing, the cassette-substrate arrangement is unloaded from the box-cassette-substrate arrangement. The cassette-substrate arrangement is then loaded into a loadlock where it can be transitioned from atmospheric pressure to vacuum. During transitioning, the filters and vents restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.

A reticle protection and transport system and method for a lithography tool. The system includes an indexer that stores a plurality of reticles and a removable reticle cassette. The removable reticle cassette is comprised of an inner chamber and an outer chamber. The system further includes an end effector coupled to a robotic arm. The end effector engages one of the plurality of reticles to enable the reticle to be positioned within the removable reticle cassette and thereafter transported. The system further includes a seal, coupled to the end effector and the robotic arm. To transport the reticle, the reticle is first loaded onto the end effector. Next, the end effector is used to create an arrangement wherein the reticle is loaded into the removable reticle cassette. Importantly, the reticle and removable reticle cassette do not come into contact with one another. The reticle and removable reticle cassette arrangement is then sealed and transported from the indexer to a mount for performing lithographic exposure. Once lithographic exposure is completed, the arrangement is returned to the indexer and the reticle is withdrawn from the removable reticle cassette.

Growing community of inventors

Redding, CT, United States of America

Glenn Friedman