Dupont Photomasks, Inc.

Glenn Edward Storm

Joseph Stephen Gordon

Franklin Dean Kalk

Gregory P Hughes

Hakki Ufuk Alpay

John E Buzerak

Craig A West

Susan S MacDonald

James A Carroll, Iii

Greg A Fariss

A method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism are disclosed. A pellicle is coupled to a photomask with a non-distorting mechanism that is located on a pellicle frame opposite a thin film coupled to the pellicle frame. The non-distorting mechanism acts to reduce stress exerted on the photomask by the pellicle.

Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism

A method for constructing a photomask assembly using an encoded mark is disclosed. The method includes comparing a first encoded mark located on a photomask with a second encoded mark located on a pellicle. The first encoded mark includes one or more first symbols and the second encoded mark includes one or more second symbols. The method further includes mounting the pellicle on the photomask if at least one of the symbols of the first encoded mark matches at least one of the symbols of the second encoded mark.

Method for constructing a photomask assembly using an encoded mark

A method and apparatus for trimming a pellicle film using a laser are disclosed. A laser trimming assembly includes a modified laser-cutting head coupled to a laser. The laser includes a laser beam for trimming a pellicle film that extends beyond a perimeter of a pellicle frame. The modified laser-cutting head includes a nozzle and at least one hose port located on the nozzle. The hose port may receive a vacuum hose for removing particulate matter created during a trimming process.

Method and apparatus for trimming a pellicle film using a laser

A pattern mask pellicle comprising a peripheral frame, a transparent film extending across the top peripheral surface of the frame, and a peripheral gasket adhered to the bottom peripheral surface of the frame, the frame/gasket assembly including at least one tacky, continuous, tortuous path connecting an opening in the interior wall of the assembly with an opening in the exterior wall of the assembly. At least one pellicle is mounted on a pattern mask substrate to protect the pattern area during imaging in the production of integrated circuits.

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Ridgefield, CT, United States of America

Glenn Edward Storm